to the Second Edition Since the first (1986) edition of this book, the numbers of installations, researchers, and research publications devoted to electron energy-loss spec troscopy (EELS) in the electron microscope have continued to expand. There has been a trend towards intermediate accelerating voltages and field-emission sources, both favorable to energy-loss spectroscopy, and sev eral types of energy-filtering microscope are now available commercially. Data-acquisition hardware and software, based on personal computers, have become more convenient and user-friendly. Among university re searchers, much thought has been given to the interpretation and utilization of near-edge fine structure. Most importantly, there have been many practi cal applications of EELS. This may reflect an increased awareness of the potentialities of the technique, but in many cases it is the result of skill and persistence on the part of the experimenters, often graduate students. To take account of these developments, the book has been extensively revised (over a period of two years) and more than a third of it rewritten. I have made various minor changes to the figures and added about 80 new ones. Except for a few small changes, the notation is the same as in the first edition, with all equations in SI units.

Energy-Filtering Transmission Electron Microscopy (EFTEM) presents a summary of the electron optics, the electron-specimen interactions, and the operation and contrast modes of this new field of analytical electron microscopy. The electron optics of filter lenses and the progress in the correction of aberrations are discussed in detail. An evaluation of our present knowledge of plasmon losses and inner-shell ionisations is of increasing interest for a quantitative application of EFTEM in materials and life sciences. This can be realized not only by filtering the elastically scattered electrons but mainly by imgaging and analyzing with inelastically scattered electrons at different energy losses up to 2000 eV. The strength of EFTEM is the combination of the modes EELS, ESI, ESD and REM.

The aim of this book is to outline the physics of image formation, electron specimen interactions and image interpretation in transmission electron mic roscopy. The book evolved from lectures delivered at the University of Munster and is a revised version of the first part of my earlier book Elek tronenmikroskopische Untersuchungs- und Priiparationsmethoden, omitting the part which describes specimen-preparation methods. In the introductory chapter, the different types of electron microscope are compared, the various electron-specimen interactions and their applications are summarized and the most important aspects of high-resolution, analytical and high-voltage electron microscopy are discussed. The optics of electron lenses is discussed in Chapter 2 in order to bring out electron-lens properties that are important for an understanding of the function of an electron microscope. In Chapter 3, the wave optics of elec trons and the phase shifts by electrostatic and magnetic fields are introduced; Fresnel electron diffraction is treated using Huygens' principle. The recogni tion that the Fraunhofer-diffraction pattern is the Fourier transform of the wave amplitude behind a specimen is important because the influence of the imaging process on the contrast transfer of spatial frequencies can be described by introducing phase shifts and envelopes in the Fourier plane. In Chapter 4, the elements of an electron-optical column are described: the electron gun, the condenser and the imaging system. A thorough understanding of electron-specimen interactions is essential to explain image contrast.

Analytical electron microscopy is one of the most powerful tools today for characterization of the advanced materials that support the nanotechnology of the twenty-first century. In this book the authors clearly explain both the basic principles and the latest developments in the field. In addition to a fundamental description of the inelastic scattering process, an explanation of the constituent hardware is provided. Standard quantitative analytical techniques employing electron energy-loss spectroscopy and energy-dispersive X-ray spectroscopy are also explained, along with elemental mapping techniques. Included are sections on convergent beam electron diffraction and electron holography utilizing the field emission gun. With generous use of illustrations and experimental data, this book is a valuable resource for anyone concerned with materials characterization, electron microscopy, materials science, crystallography, and instrumentation.

This groundbreaking text has been established as the market leader throughout the world. Profusely illustrated, the book provides the necessary instructions for successful hands-on application of this versatile materials characterization technique.