This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.

Electric glow discharges (glows) can be found almost everywhere, from atmospheric electricity to modern plasma technologies, and have long been the object of research. The main purpose of this book is to provide simple illustrations of the basic physical mechanisms and principles that determine the properties of electric glow discharges. It should enable readers to successfully participate in scientific and technical progress.

Publishes papers on plasma physics. The journal covers the following topics: high-temperature plasma physics, connected with the problem of controlled nuclear fusion based on magnetic and inertial confinement; physics of cosmic plasma including magnetosphere plasma, sun and stellar plasma, etc.; gas discharge plasma and plasma generated by laser and particle beams.

The Sixth International Symposium on Gaseous Dielectrics was held in Knoxville, Tennessee, U.S.A., on September 23-27, 1990. The symposium continued the trans disciplinary character and comprehensive approach of the preceding five symposia. Gaseous Dielectrics VI is a detailed record of the symposium proceedings. It covers recent advances and developments in a wide range of basic, applied and industrial areas of gaseous dielectrics. It is hoped that Gaseous Dielectrics VI will aid future research and development in and encourage wider industrial use of gaseous dielectrics. The Organizing Committee of the Sixth International Symposium on Gaseous Dielectrics consisted of L. G. Christophorou (U.S.A.), F. Y. Chu (Canada), A. H. Cookson (U.S.A.), D. L. Damsky (U.S.A.), O. Farish (U.K.), I. Gallimberti (Italy), A. Garscadden (U.S.A.), E. Marode (France), T. Nitta (Japan), W. Pfeiffer (Germany), I. Sauers (U.S.A.), R. J. Van Brunt (U.S.A.), and W. Zaengl (Switzerland). The local arrangements committee consisted of members of the Health and Safety Research Division and personnel of the Conference Office of the Oak Ridge National Laboratory, and staff of the University of Tennessee (UTK). The contributions of each member of these committees, the work of the Session Chairmen, the interest of the participants, and the advice of innumerable colleagues are gratefully acknowledged.

This is a comprehensive textbook designed for graduate and advanced undergraduate students. Both authors rely on more than 20 years of teaching experience in renowned Physics Engineering courses to write this book addressing the students’ needs. Kinetics and Spectroscopy of Low Temperature Plasmas derives in a full self-consistent way the electron kinetic theory used to describe low temperature plasmas created in the laboratory with an electrical discharge, and presents the main optical spectroscopic diagnostics used to characterize such plasmas. The chapters with the theoretical contents make use of a deductive approach in which the electron kinetic theory applied to plasmas with basis on the electron Boltzmann equation is derived from the basic concepts of Statistical and Plasma Physics. On the other hand, the main optical spectroscopy diagnostics used to characterize experimentally such plasmas are presented and justified from the point of view of the Atomic and Molecular Physics. Low temperature plasmas (LTP) are partially ionized gases with a broad use in many technological applications such as microelectronics, light sources, lasers, biology and medicine. LTPs lead to the production of atomic and molecular excited states, chemically reactive radicals, and activated surface sites, which are in the origin, among others, of the deposition of thin films, advanced nanotechnology products, solar cells, highly efficient combustion motors, and treatment of cancer cells.

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

This comprehensive, detailed treatise on the physics and applications of the new emerging technology of amorphous semiconductors focuses on specific device research problems such as the optimization of device performance. The first part of the book presents hydrogenated amorphous silicon type alloys, whose applications include inexpensive solar cells, thin film transistors, image scanners, electrophotography, optical recording and gas sensors. The second part of the book discusses amorphous chalcogenides, whose applications include electrophotography, switching, and memory elements. This book will serve as an excellent reference source for solid state scientists and engineers, and as a useful self-contained introduction to the field for graduate students.