This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.

This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, plasma volume, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. Now in its second edition, the book has been substantially expanded and updated to address the many developments since it was first published, most importantly the development and investigation of cesiated surfaces with work function ~1.2-1.3 eV in conditions close to discharges in surface plasma sources. The book also includes a new chapter on development of conversion targets for high-energy neutral beam injectors, covering gas targets, plasma targets and photon targets for efficient conversion of high energy negative ion beams to neutral beams. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.

This book gives a comprehensive overview of hydrogen negative ion sources and their applications to particle acceleration and nuclear fusion. The book begins with fundamental aspects of negative ion production by volume and surface processes in hydrogen and its isotopes. It covers key topics, such as the need for separation of negative ion production and extraction regions, the need for lowering the work function of the plasma electrode by using caesium vapor or special materials for caesium-free sources, and the ion extractor structure required for hydrogen negative ion sources. Chapters covering various specific ion sources and applications are written by scientists who participated in their development and include sources for accelerators and for neutral beam injection into controlled nuclear fusion reactors.

During the past few years or so, the development of steady state sources of negative hydrogen or deuterium ions has made a substantial progress. There are several approaches under investigation, some operating with long pulses and some in a true steady state, and delivering H− or D− beam currents of several hundred mA up to 1 A. The improvement in the gas efficiency from a few percent for pulsed sources to the range of 5% to 15% and possibly even higher for the new sources, is another advance that was not anticipated only 4 to 5 years ago. A higher gas efficiency has come as the result of using independent plasma generation and geometrical focusing of surface produced negative ions. The power efficiency has not been changed so much, but, in a high energy system, savings of a few kW/A are less important than the reduction of the gas load. It can be expected that within five or so years a small (

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.