Explores the impact of the latest breakthroughs in cluster SIMS technology Cluster secondary ion mass spectrometry (SIMS) is a high spatial resolution imaging mass spectrometry technique, which can be used to characterize the three-dimensional chemical structure in complex organic and molecular systems. It works by using a cluster ion source to sputter desorb material from a solid sample surface. Prior to the advent of the cluster source, SIMS was severely limited in its ability to characterize soft samples as a result of damage from the atomic source. Molecular samples were essentially destroyed during analysis, limiting the method's sensitivity and precluding compositional depth profiling. The use of new and emerging cluster ion beam technologies has all but eliminated these limitations, enabling researchers to enter into new fields once considered unattainable by the SIMS method. With contributions from leading mass spectrometry researchers around the world, Cluster Secondary Ion Mass Spectrometry: Principles and Applications describes the latest breakthroughs in instrumentation, and addresses best practices in cluster SIMS analysis. It serves as a compendium of knowledge on organic and polymeric surface and in-depth characterization using cluster ion beams. It covers topics ranging from the fundamentals and theory of cluster SIMS, to the important chemistries behind the success of the technique, as well as the wide-ranging applications of the technology. Examples of subjects covered include: Cluster SIMS theory and modeling Cluster ion source types and performance expectations Cluster ion beams for surface analysis experiments Molecular depth profiling and 3-D analysis with cluster ion beams Specialty applications ranging from biological samples analysis to semiconductors/metals analysis Future challenges and prospects for cluster SIMS This book is intended to benefit any scientist, ranging from beginning to advanced in level, with plenty of figures to help better understand complex concepts and processes. In addition, each chapter ends with a detailed reference set to the primary literature, facilitating further research into individual topics where desired. Cluster Secondary Ion Mass Spectrometry: Principles and Applications is a must-have read for any researcher in the surface analysis and/or imaging mass spectrometry fields.

The work presented in this dissertation is concentrated on improving the fundamental understanding of molecular depth profiling and chemical imaging associated with time-of-flight secondary ion mass spectrometry (ToF-SIMS) equipped with cluster ion sources, mainly C60 and argon gas cluster ion beams (Ar-GCIBs). A gold-cholesterol hybrid system is used to elucidate the reasons for the difficulties of depth profiling of heterogeneous thin film structures. The model study provides mechanistic insight into depth profiling of hybrid materials and offers an appropriate strategy for improving the quality of the depth profiles. Depth profiling of trehalose thin films is investigated under different Ar-GCIBs bombardment conditions to elucidate the influence of cluster size and kinetic energy on the formation of molecular ions. The study provides insight into selecting optimal Ar-GCIBs characteristics for molecular depth profiling of organic materials. Finally, room temperature ionic liquids (ILs) are employed in mass spectrometry imaging experiments. The surface and the internal structure of microspheres synthesized in ILs are investigated by the high spatial resolution imaging and depth profiling capabilities of cluster ToF-SIMS. The study introduces a new type of matrix for imaging mass spectrometry and provides insight into the key drivers and restraints behind ToF-SIMS three-dimensional (3D) molecular analysis. Overall, the thesis work is of great value for the fundamental understanding cluster ion-solid interactions in ToF-SIMS analysis and is beneficial for the advancement of the technique.

Serves as a practical reference for those involved in Secondary Ion Mass Spectrometry (SIMS) • Introduces SIMS along with the highly diverse fields (Chemistry, Physics, Geology and Biology) to it is applied using up to date illustrations • Introduces the accepted fundamentals and pertinent models associated with elemental and molecular sputtering and ion emission • Covers the theory and modes of operation of the instrumentation used in the various forms of SIMS (Static vs Dynamic vs Cluster ion SIMS) • Details how data collection/processing can be carried out, with an emphasis placed on how to recognize and avoid commonly occurring analysis induced distortions • Presented as concisely as believed possible with All sections prepared such that they can be read independently of each other

This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.