Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.

"This volume is the first in a series of three books that make up the second edition of Chemistry and Lithography, which is continued in volume 2 (Chemistry in Lithography) and volume 3 (The Practice of Lithography). Each volume is a unit in itself and can stand alone, which is fortunate in view of their different subject matters. Volume 1 of the present edition weaves together threads of a narrative on the history of optical and molecular physics, optical technology, chemistry, and lithography, with a view to creating a rich tapestry that gives the reader new insights into an aspect of the relationships between these fields that are often not fully appreciated: how the marriage between chemistry and optics led to the development and evolution of lithography. We show how major developments in chemistry, physics and technology of light influenced the invention and development of lithography, well beyond what its inventor envisioned. We also show how developments in lithography have not only influenced the development of optics and chemistry, but also played a critical role in the large scale manufacture of integrated circuits that run the computers and machineries on which our modern electronic and information age depend. Part of the analysis in this volume is necessarily skewed towards the underlying science and technologies of advanced lithographic patterning techniques, in terms of materials, processes, imaging, along with their unique features, strengths and limitations. This book also provides an analysis of the emerging trends in lithographic patterning, along with the current and potential applications of the resulting patterned structures and surfaces"--

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

"This volume is the first in a series of three books that make up the second edition of Chemistry and Lithography, which is continued in volume 2 (Chemistry in Lithography) and volume 3 (The Practice of Lithography). Each volume is a unit in itself and can stand alone, which is fortunate in view of their different subject matters. Volume 1 of the present edition weaves together threads of a narrative on the history of optical and molecular physics, optical technology, chemistry, and lithography, with a view to creating a rich tapestry that gives the reader new insights into an aspect of the relationships between these fields that are often not fully appreciated: how the marriage between chemistry and optics led to the development and evolution of lithography. We show how major developments in chemistry, physics and technology of light influenced the invention and development of lithography, well beyond what its inventor envisioned. We also show how developments in lithography have not only influenced the development of optics and chemistry, but also played a critical role in the large scale manufacture of integrated circuits that run the computers and machineries on which our modern electronic and information age depend. Part of the analysis in this volume is necessarily skewed towards the underlying science and technologies of advanced lithographic patterning techniques, in terms of materials, processes, imaging, along with their unique features, strengths and limitations. This book also provides an analysis of the emerging trends in lithographic patterning, along with the current and potential applications of the resulting patterned structures and surfaces"--