Chemical Vapor Deposition of WNxCy Thin Films for Diffusion Barrier Application
Title | Chemical Vapor Deposition of WNxCy Thin Films for Diffusion Barrier Application PDF eBook |
Author | Hiral M. Ajmera |
Publisher | |
Pages | |
Release | 2007 |
Genre | |
ISBN |
CVD thin film deposition from 3a, b, 4, and 5 highlights the importance of precursor selection and deposition parameters (e.g., coreactant selection, deposition temperature) on the film properties and diffusion barrier performance. Detailed film characterization and preliminary diffusion barrier testing revealed that films deposited with 3a, b and NH3 exhibited the most promise for diffusion barrier applications. To aid the precursor screening process and help understand the mechanism of precursor fragmentation prior to the growth studies, quantum mechanical (QM) calculations using density functional theory were carried out. Statistical mechanics along with QM calculations were employed to determine the energy barrier of potential reaction pathways which would lead to the deposition of WNxCy thin film. QM calculations for fragmentation of precursor 5 showed that the first step of precursor fragmentation was dissociation of the CH3CN ligand, followed by removal of the Cl ligands by either sigma-bond metathesis or reductive elimination.
Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications
Title | Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications PDF eBook |
Author | Omar Bchir |
Publisher | |
Pages | 432 |
Release | 2019-05-31 |
Genre | Technology & Engineering |
ISBN | 9780530008301 |
Abstract: PhD Dissertation: MOCVD of WNx Dissertation Discovery Company and University of Florida are dedicated to making scholarly works more discoverable and accessible throughout the world. This dissertation, "Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications" by Omar James Bchir, was obtained from University of Florida and is being sold with permission from the author. A digital copy of this work may also be found in the university's institutional repository, IR@UF. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation.
Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications
Title | Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications PDF eBook |
Author | Omar James Bchir |
Publisher | |
Pages | 838 |
Release | 2004 |
Genre | |
ISBN |
Chemical Vapor Deposition
Title | Chemical Vapor Deposition PDF eBook |
Author | S Neralla |
Publisher | BoD – Books on Demand |
Pages | 292 |
Release | 2016-08-31 |
Genre | Science |
ISBN | 9535125729 |
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Chemical Vapor Deposition of Ti-Si-N Films for Diffusion Barrier Applications
Title | Chemical Vapor Deposition of Ti-Si-N Films for Diffusion Barrier Applications PDF eBook |
Author | |
Publisher | |
Pages | |
Release | 1995 |
Genre | |
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Chemical Vapor Deposition Polymerization
Title | Chemical Vapor Deposition Polymerization PDF eBook |
Author | Jeffrey B. Fortin |
Publisher | Springer Science & Business Media |
Pages | 112 |
Release | 2013-03-09 |
Genre | Science |
ISBN | 147573901X |
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Chemical Vapor Deposition
Title | Chemical Vapor Deposition PDF eBook |
Author | M. L. Hitchman |
Publisher | Academic Press |
Pages | 692 |
Release | 1993-04-13 |
Genre | Science |
ISBN |
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.