Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566
Title | Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 PDF eBook |
Author | S. V. Babu |
Publisher | |
Pages | 304 |
Release | 2000-02-10 |
Genre | Technology & Engineering |
ISBN |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613
Title | Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613 PDF eBook |
Author | Rajiv K. Singh |
Publisher | Cambridge University Press |
Pages | 0 |
Release | 2001-04-16 |
Genre | Technology & Engineering |
ISBN | 9781558995215 |
Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. Other emerging applications for this technology include flat-panel displays, magnetic data storage and microelectromechanical systems. The rapid emergence of copper as the conducting material for integrated circuits has further pushed CMP technology to the forefront of semiconductor manufacturing. However, a basic understanding of the CMP process, which is necessary to enable further advances, is inadequate. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured. Topics include: CMP mechanisms; dielectric and metal CMP; process integration and manufacturability; and CMP consumables.
Microelectronic Applications of Chemical Mechanical Planarization
Title | Microelectronic Applications of Chemical Mechanical Planarization PDF eBook |
Author | Yuzhuo Li |
Publisher | John Wiley & Sons |
Pages | 764 |
Release | 2007-10-19 |
Genre | Technology & Engineering |
ISBN | 0471719196 |
An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.
Chemical-mechanical Polishing--fundamentals and Challenges
Title | Chemical-mechanical Polishing--fundamentals and Challenges PDF eBook |
Author | |
Publisher | |
Pages | 281 |
Release | 1999 |
Genre | Chemical mechanical planarization |
ISBN |
Chemical Mechanical Planarization VI
Title | Chemical Mechanical Planarization VI PDF eBook |
Author | Sudipta Seal |
Publisher | The Electrochemical Society |
Pages | 370 |
Release | 2003 |
Genre | Technology & Engineering |
ISBN | 9781566774048 |
Electrochemical Processing in ULSI Fabrication III
Title | Electrochemical Processing in ULSI Fabrication III PDF eBook |
Author | Panayotis C. Andricacos |
Publisher | The Electrochemical Society |
Pages | 262 |
Release | 2002 |
Genre | Computers |
ISBN | 9781566772730 |
"Held May 2000 in Toronto, Canada, as part of the 197th meeting of the Electrochemical Society."--Pref.
Role of Chemical Engineering in Processing of Minerals and Materials
Title | Role of Chemical Engineering in Processing of Minerals and Materials PDF eBook |
Author | |
Publisher | Allied Publishers |
Pages | 220 |
Release | 2003 |
Genre | Chemical engineering |
ISBN | 9788177645637 |