A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source that has two ECR plasma production regions and uses multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasma over large areas of 300 to 400 cm2 and could be scaled up to produce uniform plasma over 700 cm2 or larger. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The working gases used were argon, helium, hydrogen, and oxygen. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of the discharge parameters. The discharge characteristics and a hypothetical discharge mechanism for this plasma source are described and discussed. Potential applications, including plasma and ion-beam sources for manufacturing advanced microelectronics, for space electric propulsion, and for fusion research, are discussed. 10 refs., 10 figs.

A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source using two ECR plasma production regions and multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasmas over large areas of 300 to 400 cm2. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of discharge parameters. Together with the discharge characteristics observed, a hypothetical discharge mechanism for this plasma source is reported and discussed. Potential applications, including plasma and ion-beam processing for manufacturing advanced microelectronics and for space electric propulsion, are discussed. 7 refs., 6 figs.

This report contains papers on the following topics: Recent Developments and Future Projects on ECR Ion Sources; Operation of the New KVI ECR Ion Source at 10 GHz; Operational Experience and Status of the INS SF-ECR Ion Source; Results of the New ECR4'' 14.5 GHz ECRIS; Preliminary Performance of the AECR; Experimental Study of the Parallel and Perpendicular Particle Losses from an ECRIS Plasma; Plasma Instability in Electron Cyclotron Resonance Heated Ion Sources; The Hyperbolic Energy Analyzer; Status of ECR Source Development; The New 10 GHz CAPRICE Source; First Operation of the Texas A M ECR Ion Source; Recent Developments of the RIKEN ECR Ion Sources; The 14 GHz CAPRICE Source; Characteristics and Potential Applications of an ORNL Microwave ECR Multicusp Plasma Ion Source; ECRIPAC: The Production and Acceleration of Multiply Charged Ions Using an ECR Plasma; ECR Source for the HHIRF Tandem Accelerator; Feasibility Studies for an ECR-Generated Plasma Stripper; Production of Ion Beams by using the ECR Plasmas Cathode; A Single Stage ECR Source for Efficient Production of Radioactive Ion Beams; The Single Staged ECR Source at the TRIUMF Isotope Separator TISOL; The Continuous Wave, Optically Pumped H− Source; The H ECR Source for the LAMPF Optically Pumped Polarized Ion Source; Present Status of the Warsaw CUSP ECR Ion Source; An ECR Source for Negative Ion Production; GYRAC-D: A Device for a 200 keV ECR Plasma Production and Accumulation; Status Report of the 14.4 GHZ ECR in Legnaro; Status of JYFL-ECRIS; Report on the Uppsala ECRIS Facility and Its Planned Use for Atomic Physics; A 10 GHz ECR Ion Source for Ion-Electron and Ion-Atom Collision Studies; and Status of the ORNL ECR Source Facility for Multicharged Ion Collision Research.