The APS Topical Conference on Atomic Processes in Plasmas brings together researchers working in atomic physics and in plasma science, emphasizing the strong and synergistic overlap of these fields. The latest developments in atomic physics reported are recent advances in plasma science, such as in magnetic or inertial confinement fusion, Z-pinches, astrophysics, and technical plasma processing.

All papers were peer-reviewed for this proceedings volume. The conference focused on atomic physics relevant to plasmas, and plasma science dependent on atomic processes, from either a modeling or diagnostics point of view. Also, an exciting breakthrough discovery was first announced at this conference on a new antihydrogen formation technique. Topics include the relatively mature research areas of atomic structure and collisions, atomic kinetics, laser-produced plasmas, magnetic- and inertial-confinement fusion, Z-pinches, opacities and equation of state, lighting, and astrophysics, as well as the burgeoning areas of warm dense matter simulations and ultracold plasmas used, for example, in the recent formation of antihydrogen.

Gaithersburg, Maryland, 19-22 March 2007

This book provides a compact yet comprehensive overview of recent developments in collisional-radiative (CR) modeling of laboratory and astrophysical plasmas. It describes advances across the entire field, from basic considerations of model completeness to validation and verification of CR models to calculation of plasma kinetic characteristics and spectra in diverse plasmas. Various approaches to CR modeling are presented, together with numerous examples of applications. A number of important topics, such as atomic models for CR modeling, atomic data and its availability and quality, radiation transport, non-Maxwellian effects on plasma emission, ionization potential lowering, and verification and validation of CR models, are thoroughly addressed. Strong emphasis is placed on the most recent developments in the field, such as XFEL spectroscopy. Written by leading international research scientists from a number of key laboratories, the book offers a timely summary of the most recent progress in this area. It will be a useful and practical guide for students and experienced researchers working in plasma spectroscopy, spectra simulations, and related fields.

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

The International Conference on Atomic and Molecular Data and Their Applications is a forum for researchers who produce, collect, evaluate, disseminate, and apply atomic and molecular data, particularly in gaseous and plasma environments. These include applications in technical plasma processing, lighting, astrophysics, medical radiation physics, and inertial and magnetic confinement fusion, for example.

This book addresses both fundamental issues and applications in the field of x-ray and inner-shell processes induced by photons, particles, or nuclear conversion. The volume contains the invited talks and all papers have been peer reviewed. This meeting brings scientists together from different disciplines of x-ray science and technology. Focus has been given to the applications of the high brilliance synchrotron x- ray sources in physics, chemistry, biology, engineering and related fields. The book is of interest to scientists in atomic, molecular and solid state physics using synchrotron radiation sources, plasma and x-ray lasers, manufacturers of x-ray equipment, electron and ion analysis apparatus, semiconductor industry chemical industry requiring advanced analytical equipment. Topics include: historical reviews; new x-ray sources and techniques; advances in x-ray optics; photoionization processes and highly charged ions; atomic and nuclear x-ray processes; x-ray scattering; x-ray applications to solids and surfaces; and biological applications.