The Optical Society of America Conference on Applications of High Fields and Short Wavelength Sources, held in Santa Fe, New Mexico, USA, from March 20-22, 1997, was an exceptionally exciting conference. This conference was the seventh in a series of topical con ferences, held every two years, which are devoted to the generation and application of high field and short wavelength sources. The meeting was truly international in scope, with equal participation from both within and outside of the US. In the past two years, there has been dramatic progress in both laser and x-ray coher ent sources, both fundamental and applied. The 1997 meeting highlighted these advances, which are summarized in sections 1 and 2 of this volume. Terawatt-class lasers are now avail able in the UV or at high repetition rates. Michael Perry (LLNL) presented a keynote talk on petawatt class lasers and their applications in inertial confinement fusion, while Jorge Rocca (Colorado State University) presented a keynote talk on tabletop soft-x-ray lasers. Genera tion and measurement techniques are becoming very sophisticated throughout the UV and x ray region of the spectrum, and coherent sources have been extended to wavelengths below 30A. Phase control in the x-ray region is also now possible, and new phase-matching schemes in the UV have been experimentally demonstrated. It is clear that a new field of x-ray nonlin ear optics will deveiop rapidly over the next few years.

This book brings together in a single volume the most up-to-date results in the field presented at Ultrafast Optics and Applications of High Field and Short Wavelength Sources 2005. The volume contains keynote and invited contributions together with carefully selected regular contributions. The book aims at the highest level of presentation to make it useful as a reference for those working in the field.

This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics.Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.

Advances in Atomic, Molecular, and Optical Physics, Volume 69, the latest release in this ongoing series, provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth, as new experimental and theoretical techniques are used on many problems, both old and new. Topics covered in this new release include Strong-field ion spectroscopy, Configurable microscopic optical potentials, Polaritons, Rydberg excitation of trapped cold ions - a new platform for quantum technologies, High intensity QED, Recollision imaging, and more. - Presents the work of international experts in the field - Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging - Ideal for users interested in optics, excitons, plasmas and thermodynamics - Covers atmospheric science, astrophysics, and surface and laser physics, amongst other topics

Since the advent of the laser about 40 years ago, the fields of laser physics and quantum optics have evolved into a major disciplines. The early studies included optical coherence theory and semiclassical and quantum mechanical theories of the laser. More recently many new and interesting effects have been predicted. These include the role of coherent atomic effects in lasing without inversion and electromagnetically induced transparency, atom optics, laser cooling and trapping, teleportation, the single-atom micromaser and its role in quantum measurement theory, to name a few. The International Conference on Laser Physics and Quantum Optics was held in Shanghai, China, from August 25 to August 28,1999, to discuss these and many other exciting developments in laser physics and quantum optics. The international character of the conference was manifested by the fact that scientists from over 13 countries participated and lectured at the conference. There were four keynote lectures delivered by Nobel laureate Willis Lamb, Jr., Profs. H. Walther, A.E. Siegman,and M.O. Scully. In addition, there were 34 invited lectures, 27 contributed oral presentations, and 59 poster papers. We are grateful to all the participants of the conference and the contributors of this volume.

Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore routinely available as analytical tools, if they are confined to synchrotrons. This is because synchrotrons require enormous capital and infrastructure costs and are often, of necessity, national or international facilities. This seriously limits their scope for applications in research and analysis, in both academia and industry. How many universities, research institutes or even industrial laboratories would have electron microscopes if electron sources cost ú100M or more Hence the need to develop bright but small and (relatively) cheap x-ray sources, not to replace synchrotrons but to complement them. Written by a distinguished team of international authors this exemplary new handbook is based on the COST Action MP0601: Short Wavelength Laboratory Sources. The contents are divided into five main sections. The introductory section provides a comprehensive introduction to the fundamentals of radiation, generation mechanisms and short wavelength laboratory sources. The middle sections focus on modelling and simulation, source development: improvement and characterisation and integrated systems: sources, optics and detectors. The final section looks at recent applications.

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.