The tenth edition of The Manual of Photography is an indispensable textbook for anyone who is serious about photography. It is ideal if you want to gain insight into the underlying scientific principles of photography and digital imaging, whether you are a professional photographer, lab technician, researcher or student in the field, or simply an enthusiastic amateur. This comprehensive guide takes you from capture to output in both digital and film media, with sections on lens use, darkroom techniques, digital cameras and scanners, image editing techniques and processes, workflow, digital file formats and image archiving. This iconic text was first published in 1890 and has aided many thousands of photographers in developing their own techniques and understanding of the medium. Now in full colour, The Manual of Photography still retains its clear, reader-friendly style and is filled with images and illustrations demonstrating the key principles. Not only giving you the skills and know-how to take stunning photographs, but will also allowing you to fully understand the science behind the creation of great images.

This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.