Advanced Metallization and Interconnect Systems for ULSI Applications in 1996: Volume 12
Title | Advanced Metallization and Interconnect Systems for ULSI Applications in 1996: Volume 12 PDF eBook |
Author | Robert Havemann |
Publisher | Mrs Conference Proceedings |
Pages | 640 |
Release | 1997 |
Genre | Computers |
ISBN |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization and Interconnect Systems for ULSI Applications in 1997:
Title | Advanced Metallization and Interconnect Systems for ULSI Applications in 1997: PDF eBook |
Author | Robin Cheung |
Publisher | Materials Research Society |
Pages | 765 |
Release | 2000-02-01 |
Genre | Technology & Engineering |
ISBN | 9781558994126 |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization and Interconnect Systems for ULSI Applications in 1995:
Title | Advanced Metallization and Interconnect Systems for ULSI Applications in 1995: PDF eBook |
Author | Russell C. Ellwanger |
Publisher | Materials Research Society |
Pages | 767 |
Release | 2000-02-01 |
Genre | Technology & Engineering |
ISBN | 9781558993419 |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Interconnects and Contacts: Volume 564
Title | Advanced Interconnects and Contacts: Volume 564 PDF eBook |
Author | Daniel C. Edelstein |
Publisher | |
Pages | 606 |
Release | 1999-10-07 |
Genre | Technology & Engineering |
ISBN |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Handbook of Semiconductor Manufacturing Technology
Title | Handbook of Semiconductor Manufacturing Technology PDF eBook |
Author | Yoshio Nishi |
Publisher | CRC Press |
Pages | 1720 |
Release | 2017-12-19 |
Genre | Technology & Engineering |
ISBN | 1420017667 |
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Chemical Mechanical Polishing in Silicon Processing
Title | Chemical Mechanical Polishing in Silicon Processing PDF eBook |
Author | |
Publisher | Academic Press |
Pages | 325 |
Release | 1999-10-29 |
Genre | Science |
ISBN | 0080864619 |
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials
Title | Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials PDF eBook |
Author | Hazara S. Rathore |
Publisher | The Electrochemical Society |
Pages | 278 |
Release | 1997 |
Genre | Science |
ISBN | 9781566771351 |