Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.

The bible of solar engineering that translates solar energy theory to practice, revised and updated The updated Fifth Edition of Solar Engineering of Thermal Processes, Photovoltaics and Wind contains the fundamentals of solar energy and explains how we get energy from the sun. The authors—noted experts on the topic—provide an introduction to the technologies that harvest, store, and deliver solar energy, such as photovoltaics, solar heaters, and cells. The book also explores the applications of solar technologies and shows how they are applied in various sectors of the marketplace. The revised Fifth Edition offers guidance for using two key engineering software applications, Engineering Equation Solver (EES) and System Advisor Model (SAM). These applications aid in solving complex equations quickly and help with performing long-term or annual simulations. The new edition includes all-new examples, performance data, and photos of current solar energy applications. In addition, the chapter on concentrating solar power is updated and expanded. The practice problems in the Appendix are also updated, and instructors have access to an updated print Solutions Manual. This important book: • Covers all aspects of solar engineering from basic theory to the design of solar technology • Offers in-depth guidance and demonstrations of Engineering Equation Solver (EES) and System Advisor Model (SAM) software • Contains all-new examples, performance data, and photos of solar energy systems today • Includes updated simulation problems and a solutions manual for instructors Written for students and practicing professionals in power and energy industries as well as those in research and government labs, Solar Engineering of Thermal Processes, Fifth Edition continues to be the leading solar engineering text and reference.