Discovers and explores historical scientific laws, physical principles, and viable theories, as well as the scientists who proposed them.

Reprint of the original, first published in 1869.

Reproduction of the original: The Sceptical Chymist by Robert Boyle

Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.

Encompasses many different topics in and approaches to introductory chemistry. Discusses broad areas of chemistry including organic chemistry, biochemistry, environmental chemistry, and industrial chemistry. Historical developments of chemical concepts are covered, and biographical information is provided on key individuals responsible for the development of modern chemistry.