Explores the uses of TXRF in micro- and trace analysis, and in surface- and near-surface-layer analysis • Pinpoints new applications of TRXF in different fields of biology, biomonitoring, material and life sciences, medicine, toxicology, forensics, art history, and archaeometry • Updated and detailed sections on sample preparation taking into account nano- and picoliter techniques • Offers helpful tips on performing analyses, including sample preparations, and spectra recording and interpretation • Includes some 700 references for further study

Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.

This book mostly contains contributions by the invited lecturers at the 7th International Conference on Non-Destructive Testing and Micro-Analysis for the Diagnostics and Conservation of the Cultural and Environmental Heritage. The contributors have all been chosen for their individual reputations and the quality of their research, but also because they represent a field deemed highly important. Hence, this book give balanced coverage of the areas that are most relevant in non-destructive testing and micro-analysis in the realm of cultural heritage. The analysis methods provide the clinical composition of cultural artifacts to elucidate their provenance, the rate of alteration as a result of exposure to the environment and the effectiveness of conservation and restoration strategies. The techniques are partially or fully non-destructive, are portable, or allow study of different parts of a heterogeneous work of art.