Techniques of Vacuum Ultraviolet Spectroscopy was first published in 1967. In the three decades since, the techniques associated with vacuum ultraviolet spectroscopy have been greatly expanded. Originally published as two volumes in the serial "Experimental Methods in the Physical Sciences," Vacuum Ultraviolet Spectroscopy combines in one paperback volume information on the many advances in vacuum ultraviolet (VUV) research. In addition, the book provides students and researchers with concise reviews of the important aspects of designing experiments in the VUV region.This is the only comprehensive treatise describing the use of synchrotron and other light sources for research, along with the new technologies in optical elements, multilayers, mirror coatings, soft x-ray zone plates, VUV detectors, interferometric spectrometers, and subjects such as spectromicroscopy, lithography, and photon-induced fluorescence. Vacuum Ultraviolet Spectroscopy is an ideal handbook both for the beginner and for the experienced researcher in any field requiring the use of VUV radiation. Key Features* Detailed review of synchrotron radiation sources including undulators and wigglers* Comprehensive outline of monochromator design* Concise review of optics theory for multilayers, spectrometers, and zone plates* Information about other important VUV sources such as laser produced plasmas and Electron Beam Ion Trap (EBIT) sources* Applications such as spectromicroscopy, lithography, and fluorescence

Some Aspects of Vacuum Ultraviolet Radiation Physics presents some data on the state of research in vacuum ultraviolet radiation in association with areas of physics. Organized into four parts, this book begins by elucidating the optical properties of solids in the vacuum ultraviolet region (v.u.v.), particularly the specific methods of determination of optical constants in v.u.v., the properties of metals, and those of ionic insulators. Part II deals with molecular spectroscopy, with emphasis on the spectra of diatomic and simple polyatomic molecules, paraffins, and condensed phases. Part III focuses on some aspects of emission spectroscopy in the v.u.v. in relation to laboratory plasmas. The last part describes the image formation by concave gratings, spectrophotometry, and diffusion by surfaces. This book will be very valuable to physicist and graduate students inclined to this field of interest.

These volumes contain 365 of the 505 papers presented at the VUV-11 Conference, held at Rikkyo University, Tokyo, from August 27th to September 1st 1995. The papers are divided into three sections: atomic and molecular spectroscopy, solid state spectroscopy and instrumentation and technological applications. New aspects presented were both quantitative and qualitative improvements in fluorescence spectroscopy and magnetic circular dichroism measurements. The fluorescence data are complementary to those of photoemission in a sense but they appear to open up a new method to analyze the optical excitation and relaxation processes. The application of magnetic circular dichroism has proved to be useful not only in analyzing the electronic structures of magnetic materials but also in practical applications to material engineering as found in experiments combined with photoelectron microscopy. Excellent developments in applications are only found in the field of surface photochemistry, where the technique of etching using VUV light has been appreciably refined. Although the majority of distinctive scientific features in the VUV-11 Conference have been brought about by the application of synchrotron radiation, experiments using a different type of light source appear to have progressed steadily. This is evident in the studies of plasma radiation.

This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and a

Advanced Oxidation Processes (AOPs) rely on the efficient generation of reactive radical species and are increasingly attractive options for water remediation from a wide variety of organic micropollutants of human health and/or environmental concern. Advanced Oxidation Processes for Water Treatment covers the key advanced oxidation processes developed for chemical contaminant destruction in polluted water sources, some of which have been implemented successfully at water treatment plants around the world. The book is structured in two sections; the first part is dedicated to the most relevant AOPs, whereas the topics covered in the second section include the photochemistry of chemical contaminants in the aquatic environment, advanced water treatment for water reuse, implementation of advanced treatment processes for drinking water production at a state-of-the art water treatment plant in Europe, advanced treatment of municipal and industrial wastewater, and green technologies for water remediation. The advanced oxidation processes discussed in the book cover the following aspects: - Process principles including the most recent scientific findings and interpretation. - Classes of compounds suitable to AOP treatment and examples of reaction mechanisms. - Chemical and photochemical degradation kinetics and modelling. - Water quality impact on process performance and practical considerations on process parameter selection criteria. - Process limitations and byproduct formation and strategies to mitigate any potential adverse effects on the treated water quality. - AOP equipment design and economics considerations. - Research studies and outcomes. - Case studies relevant to process implementation to water treatment. - Commercial applications. - Future research needs. Advanced Oxidation Processes for Water Treatment presents the most recent scientific and technological achievements in process understanding and implementation, and addresses to anyone interested in water remediation, including water industry professionals, consulting engineers, regulators, academics, students. Editor: Mihaela I. Stefan - Trojan Technologies - Canada