Intense Ion and Electron Beams treats intense charged-particle beams used in vacuum tubes, particle beam technology and experimental installations such as free electron lasers and accelerators. It addresses, among other things, the physics and basic theory of intense charged-particle beams; computation and design of charged-particle guns and focusing systems; multiple-beam charged-particle systems; and experimental methods for investigating intense particle beams. The coverage is carefully balanced between the physics of intense charged-particle beams and the design of optical systems for their formation and focusing. It can be recommended to all scientists studying or applying vacuum electronics and charged-particle beam technology, including students, engineers, and researchers.

An intense charged particle beam can be characterized as an organized charged particle flow for which the effects of beam self-fields are of major importance in describing the evolution of the flow. Research employing such beams is now a rapidly growing field with important applications ranging from the development of high power sources of coherent radiation to inertial confinement fusion. Major programs have now been established at several laboratories in the United States and Great Britain, as well as in the USSR, Japan, and several Eastern and Western European nations. In addition, related research activities are being pursued at the graduate level at several universities in the US and abroad. When the author first entered this field in 1973 there was no single reference text that provided a broad survey of the important topics, yet contained sufficient detail to be of interest to the active researcher. That situation has persisted, and this book is an attempt to fill the void. As such, the text is aimed at the graduate student, or beginning researcher; however, it contains ample information to be a convenient reference source for the advanced worker.

This indispensable work offers a broad synoptic description of beams, applicable to a wide range of other devices, such as low-energy focusing and transport systems and high-power microwave sources. The monograph develops the material from the basic principles in a systematic way and discusses the underlying physics and validity of theoretical relationships, design formulas and scaling laws. Assumptions and approximations are clearly indicated throughout. This new, revised and updated edition has 10% additional content, and features, among others, a new chapter on beam physics research from 1993 to 2007, significant enhancement of chapter 6 on emittance variation, updated references and color image plates.

The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.