A valuable learning tool as well as a reference, this book provides students and researchers in surface science and nanoscience with the theoretical crystallographic foundations, which are necessary to understand local structure and symmetry of bulk crystals, including ideal and real single crystal surfaces. The author deals with the subject at an introductory level, providing numerous graphic examples to illustrate the mathematical formalism. The book brings together and logically connects many seemingly disparate structural issues and notations used frequently by surface scientists and nanoscientists. Numerous exercises of varying difficulty, ranging from simple questions to small research projects, are included to stimulate discussions about the different subjects. From the contents: Bulk Crystals, Three-Dimensional Lattices - Crystal Layers, Two-Dimensional Lattices, Symmetry - Ideal Single Crystal Surfaces - Real Crystal Surfaces - Adsorbate layers - Interference Lattices - Chiral Surfaces - Experimental Analysis of Real Crystal Surfaces - Nanoparticles and Crystallites - Quasicrystals - Nanotubes

Surface science has experienced an impressive growth in the last two decades. The attention has focussed mainly on single-crystal surfaces with, on the atomic scale, relatively simple and well-defined structures (for example, clean surfaces and such surfaces with limited amounts of additional foreign atoms and molecules). One of the most fundamental types of information needed about solid surfaces concerns the relative atomic positions. The geometrical arrangement of surface atoms influences most physical and chemical properties of surfaces, the list of which is long and includes a number of important technological applications: electronic surface states, contact potentials, work functions, oxidation, heterogeneous catalysis, friction, adhesion, crys tal growth etc. Surface crystallography - the determination of relative atomic positions at surfaces - has found a successful tool in Low-Energy Electron Diffraction (LEED): this technique has now determined the atomic positions for nearly a hundred surfaces, whether in the clean state or with additional foreign atoms or molecules. The main aim of this book is to publish a set of computer pro grams that has been specifically designed for and extensively used in surface crystallography by LEED. These programs are based on the dynamical (i.e.

Surface crystallography is a discipline which has come of age. There exist in the literature several hundred complete determinations of atomic configurations at surfaces: yet the number is not so great that cataloguing these structures is too daunting a task. We felt that now was the right moment to begin a compilation that could be updated at frequent intervals to give a comprehensive picture of the known surface world. The following pages are the product of our labours. Our target community is the large number of surface chemists, materials scientists, physicists and others whose work involves surfaces. As the compilation expands with time our hope is that it will become one of the standard reference works for structures: in the manner that Wyckoff and other X-ray tables are for bulk crystals. We have devoted considerable thought to the format. The system we have chosen will no doubt have its critics, and in subsequent editions may well be improved, but it has been arrived at after extensive consultation. A problem that we faced in putting structures into standard format was the diversity of conventions used in the literature. It is to be hoped that our system will have sufficient virtue to serve as a standard format for future reporting of structures. That would make it much easier for surface crystallographers to use the work of others.

Low Energy Electron Diffraction (LEED) is one of the most commonly used techniques for crystal surface characterization at the atomic level. This book is designed to provide all the essential background information necessary to carry out surface crystallography using LEED.

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Surface crystallography plays the same fundamental role in surface science which bulk crystallography has played so successfully in solid-state physics and chemistry. The atomic-scale structure is one of the most important aspects in the understanding of the behavior of surfaces in such widely diverse fields as heterogeneous catalysis, microelectronics, adhesion, lubrication, cor rosion, coatings, and solid-solid and solid-liquid interfaces. Low-Energy Electron Diffraction or LEED has become the prime tech nique used to determine atomic locations at surfaces. On one hand, LEED has yielded the most numerous and complete structural results to date (almost 200 structures), while on the other, LEED has been regarded as the "technique to beat" by a variety of other surface crystallographic methods, such as photoemission, SEXAFS, ion scattering and atomic diffraction. Although these other approaches have had impressive successes, LEED has remained the most productive technique and has shown the most versatility of application: from adsorbed rare gases, to reconstructed surfaces of sem iconductors and metals, to molecules adsorbed on metals. However, these statements should not be viewed as excessively dogmatic since all surface sensitive techniques retain untapped potentials that will undoubtedly be explored and exploited. Moreover, surface science remains a multi-technique endeavor. In particular, LEED never has been and never will be self sufficient. LEED has evolved considerably and, in fact, has reached a watershed.

Introduction to the Properties of Crystal Surfaces is an introductory text on crystal surfaces and their properties. A variety of phenomena, including electron emission, adsorption and oxidation, adhesion, friction, nucleation and epitaxial growth, and heterogeneous catalysis, are described by considering the details of the atomic and electronic structure in the surface region. This volume is comprised of seven chapters and begins with a discussion on the thermodynamics of surfaces, along with the equilibrium configuration at the intersection of interfaces and the effects of curvature of crystalline surfaces. The next chapter examines the properties of interfaces in multi-component systems, followed by an analysis of experimental measurements of surface tension in solids. The atomic structure of crystal surfaces and some theoretical aspects of surface studies are also considered, and experimental methods in used in such studies are outlined. The final chapter deals with two atomic processes that are involved in a number of reactions at crystal surfaces: surface atomic diffusion and adsorption. This book is intended for senior undergraduates in a materials science type of curriculum or those beginning research work in the field or associated areas.