Quantitative Atomic-Resolution Electron Microscopy, Volume 217, the latest release in the Advances in Imaging and Electron Physics series merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods. Chapters in this release include Statistical parameter estimation theory, Efficient fitting algorithm, Statistics-based atom counting , Atom column detection, Optimal experiment design for nanoparticle atom-counting from ADF STEM images, and more. Contains contributions from leading authorities on the subject matter Informs and updates on the latest developments in the field of imaging and electron physics Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource

The subjects reviewed in the Advances in Imaging and Electron Physics series cover a broad range of themes including microscopy, electromagnetic fields and image coding. This volume concentrates on microscopy and pattern recognition and also electron physics. Several of these topics are covered in this volume, which opens with a long chapter of monograph stature on quantitative electron microscopy at the atomic resolution level by scientists from a well-known and very distinguished Antwerp University Laboratory. This is unique in that the statistical aspects are explored fully. This is followed by a contribution by A.M. Grigoryan and S.S. Again on transform-based image enhancement, covering both frequency-ordered systems and tensor approaches. The volume concludes with an account of the problems of image registration and ways of solving them by Maria Petrou of the University of Surrey; feature detection, related image transforms and quality measures are examined separately. The text bridges the gap between academic researchers and R&D designers by addressing and solving daily issues, which makes this book essential reading. Emphasizes broad and in depth article collaborations between world-renowned scientists in the field of image and electron physics Presents theory and it's application in a practical sense, providing long awaited solutions and new findings Provides a comprehensive overview of international congress proceedings and associated publications, as source material

This completely revised successor to the Handbook of Microscopy supplies in-depth coverage of all imaging technologies from the optical to the electron and scanning techniques. Adopting a twofold approach, the book firstly presents the various technologies as such, before going on to cover the materials class by class, analyzing how the different imaging methods can be successfully applied. It covers the latest developments in techniques, such as in-situ TEM, 3D imaging in TEM and SEM, as well as a broad range of material types, including metals, alloys, ceramics, polymers, semiconductors, minerals, quasicrystals, amorphous solids, among others. The volumes are divided between methods and applications, making this both a reliable reference and handbook for chemists, physicists, biologists, materials scientists and engineers, as well as graduate students and their lecturers.

In-Situ Transmission Electron Microscopy Experiments Design and execute cutting-edge experiments with transmission electron microscopy using this essential guide In-situ microscopy is a recently-discovered and rapidly-developing approach to transmission electron microscopy (TEM) that allows for the study of atomic and/or molecular changes and processes while they are in progress. Experimental specimens are subjected to stimuli that replicate near real-world conditions and their effects are observed at a previously unprecedented scale. Though in-situ microscopy is becoming an increasingly important approach to TEM, there are no current texts combining an up-to-date overview of this cutting-edge set of techniques with the experience of in-situ TEM professionals. In-Situ Transmission Electron Microscopy Experiments meets this need with a work that synthesizes the collective experience of myriad collaborators. It constitutes a comprehensive guide for planning and performing in-situ TEM measurements, incorporating both fundamental principles and novel techniques. Its combination of technical detail and practical how-to advice makes it an indispensable introduction to this area of research. In-Situ Transmission Electron Microscopy Experiments readers will also find: Coverage of the entire experimental process, from method selection to experiment design to measurement and data analysis Detailed treatment of multimodal and correlative microscopy, data processing and machine learning, and more Discussion of future challenges and opportunities facing this field of research In-Situ Transmission Electron Microscopy Experiments is essential for graduate students, post-doctoral fellows, and early career researchers entering the field of in-situ TEM.

Atomic resolution electron microscopy ranks as one of the most important characterization methods in materials science. Example applications range from investigating single defects to determining detailed interface reconstructions. In recent years, high-angle annular dark-field (HAADF) scanning transmission electron microscopy (STEM) has become the technique of choice because the image intensities are considered to be intuitively interpretable and depend sensitively upon the atomic species present. The combination of experiment with electron scattering theory would thus enable the extraction of chemical information directly from the images without the need for calibration standards. However, theoretical predictions of contrast in atomic resolution electron microscopy images have never agreed quantitatively with experiments, raising questions as to whether the current understanding of image formation in the electron microscope is adequate.

Principles of Electron Optic: Volume Three: Wave Optics, discusses this essential topic in microscopy to help readers understand the propagation of electrons from the source to the specimen, and through the latter (and from it) to the image plane of the instrument. In addition, it also explains interference phenomena, notably holography, and informal coherence theory. This third volume accompanies volumes one and two that cover new content on holography and interference, improved and new modes of image formation, aberration corrected imaging, simulation, and measurement, 3D-reconstruction, and more. The study of such beams forms the subject of electron optics, which divides naturally into geometrical optics where effects due to wavelength are neglected, with wave optics considered. Includes authoritative coverage of the fundamental theory behind electron beams Describes the interaction of electrons with solids and the information that can be obtained from electron-beam techniques Addresses recent, relevant research topics, including new content on holography and interference, new modes of image formation, 3D reconstruction and aberration corrected imaging, simulation and measurement