This book provides a comprehensive review of the primary industrial hygiene topics relevant to semiconductor processing: chemical and physical agents, and ventilation systems. The book also has excellent chapters on newer industrial hygiene concerns that are not specific to the semiconductor industry: ergonomics, indoor air quality, personal protective equipment, plan review, and records retention. While much of the information in these chapters can be applied to all industries, the focus and orientation is specific to issues in the semiconductor industry.

Interwoven within our semiconductor technology development had been the development of technologies aimed at identifying, evaluating and mitigating the environmental, health and safety (EH&S) risks and exposures associated with the manufacturing and packaging of integrated circuits. Driving and advancing these technologies have been international efforts by SEMI's Safety Division, the Semiconductor Safety Association (SSA), and the Semiconductor Industry Association (SIA). The purpose of the Semiconductor Safety Handbook is to provide a current, single source reference for many of the primary semiconductor EH&S technologies and disciplines. To this end, the contributors have assembled a comprehensive text written by some of the leading experts in EH&S in the semiconductor industry. This text had taken three years to complete and has involved tremendous effort and commitment by the authors.They have attempted to construct a reference manual that is comprehensive in its coverage of the technical aspects of each individual subject, while at the same time addressing practical applications of each topic. The scope of this text, from its inception, was intended to address significantly more than what would typically be classified under the definition of ""safety."" However, all of the chapters have a direct application to the protection and preservation of semiconductor employees, the surrounding communities and the environment.This book is a hands-on reference to environmental, health and safety issues critical to the semiconductor industry. It was also the author's intent to produce a text that provides a practical user's guide for semiconductor environmental, health and safety practitioners as well as those individuals responsible for operation, maintenance and production in wafer fabrication facilities.

This unique text's format makes it easy to diagnose and treat occupational toxicology patients, whether they know the substance of their exposure or not. Organized by occupation, industry, and environment, it covers what agents are plausible for exposure, systemic effects, and suggested treatments. Covers everything needed to understand, diagnose, treat and refer patients of toxic exposure.Provides a chemical agent cross-referencing system.Contains photographs from the Bettmann archives of historical photographs.Addition of new Associate Editor: Gayla McCluskey, CIH - President of the American Industrial Hygiene Association. Revises and updates all chapters with the latest information.Features 25 new chapters.Includes new contributors and new illustrations.

This book was written with several objectives in mind: 1. To share with as many scientists and engineers as possible the intriguing scientific aspects of ultra-fine particles (UFPs) and to show their potential as new materials. 2. Entice such researchers to participate in the development of this emerging field. 3. To publicize the achievements of the Ultra-Fine Particle Project, which was carried out under the auspices of the Exploratory Research for Advanced Technology program (ERATO). In addition to the members of the Ultra-Fine Particle Project, contributions from other pioneers in this field are included. To achieve the first objective described above, the uniformity of the contents and focus on a single central theme have been sacrificed somewhat to provide a broad coverage. It is expected that the reader can discover an appropriate topic for further development of new materials and basic technology by reading selected sections of this book. Alternately, one may gain an overview of this new field by reviewing the entire book, which can potentially lead to new directions in the development of UFPs.

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.

In this volume, the editor and contributors describe the use of molecular beam epitaxy (MBE) for a range of key materials systems that are of interest for both technological and fundamental reasons. Prior books on MBE have provided an introduction to the basic concepts and techniques of MBE and emphasize growth and characterization of GaAs-based structures. The aim in this book is somewhat different; it is to demonstrate the versatility of the technique by showing how it can be utilized to prepare and explore a range of distinct and diverse materials. For each of these materials systems MBE has played a key role both in their development and application to devices.