The measurement and characterisation of surface topography is crucial to modern manufacturing industry. The control of areal surface structure allows a manufacturer to radically alter the functionality of a part. Examples include structuring to effect fluidics, optics, tribology, aerodynamics and biology. To control such manufacturing methods requires measurement strategies. There is now a large range of new optical techniques on the market, or being developed in academia, that can measure areal surface topography. Each method has its strong points and limitations. The book starts with introductory chapters on optical instruments, their common language, generic features and limitations, and their calibration. Each type of modern optical instrument is described (in a common format) by an expert in the field. The book is intended for both industrial and academic scientists and engineers, and will be useful for undergraduate and postgraduate studies.

Optical methods, stimulated by the advent of inexpensive and reliable lasers, are assuming an increasingly important role in the field of engineering metrology. Requiring only a basic knowledge of optics, this text provides a compendium of practical information prepared by leaders in the field.

Since the publication of the first edition, miniaturization and nanotechnology have become inextricably linked to traditional surface geometry and metrology. This interdependence of scales has had profound practical implications.Updated and expanded to reflect many new developments, Handbook of Surface and Nanometrology, Second Edition determines h

SPIE Milestones are collections of seminal papers from the world literature covering important discoveries and developments in optics and photonics.

New material on computerized optical processes, computerized ray tracing, and the fast Fourier transform, Bibre-Bragg sensors, and temporal phase unwrapping. * New introductory sections to all chapters. * Detailed discussion on lasers and laser principles, including an introduction to radiometry and photometry. * Thorough coverage of the CCD camera.

Contents of this text include: integrated optics; silicon nitride films on silicon for optical waveguides; new technology for reduction in cost and size of silica guided-wave component; and silicon based fibre pigtailed 1x16 power splitter.

Optical Methods of Measurement: Wholefield Techniques, Second Edition provides a comprehensive collection of wholefield optical measurement techniques for engineering applications. Along with the reorganization of contents, this edition includes a new chapter on optical interference, new material on nondiffracting and singular beams and their applications, and updated bibliography and additional reading sections. The book explores the propagation of laser beams, metrological applications of phase-singular beams, various detectors such as CCD and CMOS devices, and recording materials. It also covers interference, diffraction, and digital fringe pattern measurement techniques, with special emphasis on phase measurement interferometry and algorithms. The remainder of the book focuses on theory, experimental arrangements, and applications of wholefield techniques. The author discusses digital hologram interferometry, digital speckle photography, digital speckle pattern interferometry, Talbot interferometry, and holophotoelasticity. This updated book compiles the major wholefield methods of measurement in one volume. It provides a solid understanding of the techniques by describing the physics behind them. In addition, the examples given illustrate how the techniques solve measurement problems.