Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source using two ECR plasma production regions and multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasmas over large areas of 300 to 400 cm2. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of discharge parameters. Together with the discharge characteristics observed, a hypothetical discharge mechanism for this plasma source is reported and discussed. Potential applications, including plasma and ion-beam processing for manufacturing advanced microelectronics and for space electric propulsion, are discussed. 7 refs., 6 figs.

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source that has two ECR plasma production regions and uses multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasma over large areas of 300 to 400 cm2 and could be scaled up to produce uniform plasma over 700 cm2 or larger. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The working gases used were argon, helium, hydrogen, and oxygen. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of the discharge parameters. The discharge characteristics and a hypothetical discharge mechanism for this plasma source are described and discussed. Potential applications, including plasma and ion-beam sources for manufacturing advanced microelectronics, for space electric propulsion, and for fusion research, are discussed. 10 refs., 10 figs.