Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials
Title | Plasma Enhanced Chemical Vapor Deposition of Silicon Based Thin Film Materials PDF eBook |
Author | Ashfaqul Islam Chowdhury |
Publisher | |
Pages | 374 |
Release | 1999 |
Genre | Plasma-enhanced chemical vapor deposition |
ISBN |
Plasma Deposition of Amorphous Silicon-Based Materials
Title | Plasma Deposition of Amorphous Silicon-Based Materials PDF eBook |
Author | Pio Capezzuto |
Publisher | Elsevier |
Pages | 339 |
Release | 1995-10-10 |
Genre | Science |
ISBN | 0080539106 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Study of Plasma-enhanced Chemical Vapor Deposition of Silicon Thin Films
Title | Study of Plasma-enhanced Chemical Vapor Deposition of Silicon Thin Films PDF eBook |
Author | Guanghui Yao |
Publisher | |
Pages | 148 |
Release | 1997 |
Genre | Plasma-enhanced chemical vapor deposition |
ISBN |
Handbook of Chemical Vapor Deposition
Title | Handbook of Chemical Vapor Deposition PDF eBook |
Author | Hugh O. Pierson |
Publisher | William Andrew |
Pages | 507 |
Release | 1999-09-01 |
Genre | Technology & Engineering |
ISBN | 0815517432 |
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Carbide, Nitride and Boride Materials Synthesis and Processing
Title | Carbide, Nitride and Boride Materials Synthesis and Processing PDF eBook |
Author | A.W. Weimer |
Publisher | Springer Science & Business Media |
Pages | 675 |
Release | 2012-12-06 |
Genre | Technology & Engineering |
ISBN | 9400900716 |
Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.
Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition
Title | Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition PDF eBook |
Author | Jeremy Alfred Theil |
Publisher | |
Pages | 478 |
Release | 1992 |
Genre | |
ISBN |
Plasma Deposition of Amorphous Silicon-based Materials
Title | Plasma Deposition of Amorphous Silicon-based Materials PDF eBook |
Author | Giovanni Bruno |
Publisher | |
Pages | 324 |
Release | 1995 |
Genre | Science |
ISBN | 9780121379407 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices