The purpose of the 1989 NATO ARW was to develop applications, and an improved understanding of the physics for high current emission and conduction observed in hollow cathode-hollow anode switches including the pseudo spark and BLT. New applications include highly emissive cathodes for microwave devices, accelerators and free electron lasers, high power tubes, electron and ion beams, microlithography, accelerators, and other plasma devices. Recent research has produced a new generation of gas-phase plasma switches that are characterized by very high current emission and conduction while operating in a glow mode. These switches include the pseudospark and the BLT, both of which have hollow electrodes, switch over 10 to 100 kA peak current, and have cathodes with emission ~ 2 2 10,000 Ncm over ~ 1 cm area. The cathode properties are especially remarkable - about 2 orders of magnitude larger emission than existing thermionic cathodes. Part of the meeting was devoted to understanding these properties, and exploiting applications of this cathode. The remarkable properties of these switches are very surprising in the light of considerable previous work in this area, and these results deserve study in order to understand the underlying physical mechanisms, and to develop ideas and insight into future applications, and foster coherent research in this area. The operating cycle of pseudo-spark and BL T switches and related devices can be divided into four phases: hold-off, triggering, conduction, and recovery. There was very little discussion of the hold-off and recovery phases.

Edited by internationally recognized authorities in the field, this expanded edition of the bestselling Handbook first published in 1999 is aimed at the design and operation of modern accelerators including Linacs, Synchrotrons and Storage Rings. It is intended as a vade mecum for professional engineers and physicists engaged in these subjects. With a collection of 2200 equations, 345 illustrations and 185 tables, here one will find, in addition to the common formulae of previous compilations, hard to find, specialized formulae, recipes and material data pooled from the lifetime experience of many of the world's most able practitioners of the art and science of accelerators.The eight chapters include both theoretical and practical matters as well as an extensive glossary of accelerator types. Chapters on beam dynamics and electromagnetic and nuclear interactions deals with linear and nonlinear single particle and collective effects including spin motion, beam-environment, beam-beam and intrabeam interactions. The impedance concept and calculations are dealt with at length as are the instabilities associated with the various interactions mentioned. A chapter on operational considerations deals with orbit error assessment and correction. Chapters on mechanical and electrical considerations present material data and important aspects of component design including heat transfer and refrigeration. Hardware systems for particle sources, feedback systems, confinement and acceleration (both normal conducting and superconducting) receive detailed treatment in a subsystems chapter, beam measurement techniques and apparatus being treated therein as well. The closing chapter gives data and methods for radiation protection computations as well as much data on radiation damage to various materials and devices.A detailed index is provided together with reliable references to the literature where the most detailed information available on all subjects treated can be found.

Mesyats' Pulsed Power provides in-depth coverage of the generation of pulsed electric power, electron and ion beams, and various types of pulsed electromagnetic radiation. The electric power that can be produced by the methods described ranges from 106 to 1014W for pulse durations of 10-10-10-7s. The book consists of nine parts containing 28 chapters, which deal with various aspects of pulsed power and high-power electronics and cover a concise theory of electric circuits as applied to nanosecond pulse technology; physics of fast processes occurring in electrical discharges in vacuum, gases, and liquids; phenomena in long lines; mechanisms of operation and designs of high-power gas-discharge, plasma, and semiconductor closing and opening switches as well as of high-power electric pulse generators using these switches; solid-state (semiconductor and magnetic) methods of production and transformation of nanosecond high-power pulses; and methods of production of high-power pulsed electron and ion beams. The closing part describes methods applied to produce high-power nanosecond pulsed X-rays, laser beams, microwaves, and ultrawideband electromagnetic radiation. This all-embracing book covers gas, laser, semiconductor, and magnetic circuit elements, the phenomenon of explosive electron emission discovered by the author, diodes of various types, including semiconductor diodes based on the SOS effect discovered with participation of the author, and methods of production of various types of high-power pulsed radiation.

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

The Sixth International Symposium on Gaseous Dielectrics was held in Knoxville, Tennessee, U.S.A., on September 23-27, 1990. The symposium continued the trans disciplinary character and comprehensive approach of the preceding five symposia. Gaseous Dielectrics VI is a detailed record of the symposium proceedings. It covers recent advances and developments in a wide range of basic, applied and industrial areas of gaseous dielectrics. It is hoped that Gaseous Dielectrics VI will aid future research and development in and encourage wider industrial use of gaseous dielectrics. The Organizing Committee of the Sixth International Symposium on Gaseous Dielectrics consisted of L. G. Christophorou (U.S.A.), F. Y. Chu (Canada), A. H. Cookson (U.S.A.), D. L. Damsky (U.S.A.), O. Farish (U.K.), I. Gallimberti (Italy), A. Garscadden (U.S.A.), E. Marode (France), T. Nitta (Japan), W. Pfeiffer (Germany), I. Sauers (U.S.A.), R. J. Van Brunt (U.S.A.), and W. Zaengl (Switzerland). The local arrangements committee consisted of members of the Health and Safety Research Division and personnel of the Conference Office of the Oak Ridge National Laboratory, and staff of the University of Tennessee (UTK). The contributions of each member of these committees, the work of the Session Chairmen, the interest of the participants, and the advice of innumerable colleagues are gratefully acknowledged.

The NATO . Advanced Research Insti tute on Nonequilibrium Processes in Partially Ionized Gases was held at Acquafredda di Maratea during 4-17 June 1989. The Institute considered the interconnections between scattering and transport theories and modeling of nonequilibrium systems generated by electrical discharges, emphasizing the importance of microscopic processes in affecting the bulk properties of plasmas. The book tries to reproduce these lines. In particular several contributions describe scattering cross sections involving electrons interacting with atoms and molecules in both ground and excited states (from theoretical and experimental point of view), of energy transfer processes as well as reactive ones involving excited molecules colliding with atoms and molecules as well as with metallic surfaces. Other contributions deal with the basis of transport theories (Boltzmann and Monte Carlo methods) for describing the bulk properties of non equilibrium plasmas as well as with the modeling of complicated systems emphasizing in particular the strong coupling between the Boltzmann equation and excited state kinetics. Finally the book contains several contributions describing applications in different fields such as Excimer Lasers, Negative Ion Production, RF Discharges, Plasma Chemistry, Atmospheric Processes and Physics of Lamps. The Organizing Committee gratefully acknowledges the generous financial support provided by the NATO Science Committee as well as by Azienda Autonoma di Soggiorno e Turismo of Maratea, by University of Bari, by C. N. R. (Centro di Studio per la Chimica dei Plasmi and Comitato per la Chimica), by ENEA, by Lawrence Livermore Laboratory and by US Army Research Office.

The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.