This book provides the reader with an introduction to the physics of complex plasmas, a discussion of the specific scientific and technical challenges they present and an overview of their potential technological applications. Complex plasmas differ from conventional high-temperature plasmas in several ways: they may contain additional species, including nano meter- to micrometer-sized particles, negative ions, molecules and radicals and they may exhibit strong correlations or quantum effects. This book introduces the classical and quantum mechanical approaches used to describe and simulate complex plasmas. It also covers some key experimental techniques used in the analysis of these plasmas, including calorimetric probe methods, IR absorption techniques and X-ray absorption spectroscopy. The final part of the book reviews the emerging applications of microcavity and microchannel plasmas, the synthesis and assembly of nanomaterials through plasma electrochemistry, the large-scale generation of ozone using microplasmas and novel applications of atmospheric-pressure non-thermal plasmas in dentistry. Going beyond the scope of traditional plasma texts, the presentation is very well suited for senior undergraduate, graduate students and postdoctoral researchers specializing in plasma physics.

The enlarged new edition of this textbook provides a comprehensive introduction to the basic processes in plasmas and demonstrates that the same fundamental concepts describe cold gas-discharge plasmas, space plasmas, and hot fusion plasmas. Starting from particle drifts in magnetic fields, the principles of magnetic confinement fusion are explained and compared with laser fusion. Collective processes are discussed in terms of plasma waves and instabilities. The concepts of plasma description by magnetohydrodynamics, kinetic theory, and particle simulation are stepwise introduced. Space charge effects in sheath regions, double layers and plasma diodes are given the necessary attention. The novel fundamental mechanisms of dusty plasmas are explored and integrated into the framework of conventional plasmas. The book concludes with a concise description of modern plasma discharges. Written by an internationally renowned researcher in experimental plasma physics, the text keeps the mathematical apparatus simple and emphasizes the underlying concepts. The guidelines of plasma physics are illustrated by a host of practical examples, preferentially from plasma diagnostics. There, Langmuir probe methods, laser interferometry, ionospheric sounding, Faraday rotation, and diagnostics of dusty plasmas are discussed. Though primarily addressing students in plasma physics, the book is easily accessible for researchers in neighboring disciplines, such as space science, astrophysics, material science, applied physics, and electrical engineering. This second edition has been thoroughly revised and contains substantially enlarged chapters on plasma diagnostics, dusty plasmas and plasma discharges. Probe techniques have been rearranged into basic theory and a host of practical examples for probe techniques in dc, rf, and space plasmas. New topics in dusty plasmas, such as plasma crystals, Yukawa balls, phase transitions and attractive forces have been adopted. The chapter on plasma discharges now contains a new section on conventional and high-power impulse magnetron sputtering. The recently discovered electrical asymmetry effect in capacitive rf-discharges is described. The text is based on an introductory course to plasma physics and advanced courses in plasma diagnostics, dusty plasmas, and plasma waves, which the author has taught at Kiel University for three decades. The pedagogical approach combines detailed explanations, a large number of illustrative figures, short summaries of the basics at the end of each chapter, and a selection of problems with detailed solutions.

As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the

Inductively coupled plasma atomic or mass spectrometry is one of the most common techniques for elemental analysis. Samples to be analyzed are usually in the form of solutions and need to be introduced into the plasma by means of a sample introduction system, so as to obtain a mist of very fine droplets. Because the sample introduction system can be a limiting factor in the analytical performance, it is crucial to optimize its design and its use. It is the purpose of this book to provide fundamental knowledge along with practical instructions to obtain the best out of the technique. - Fundamental as well as practical character - Troubleshooting section - Flow charts with optimum systems to be used for a given application

Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.