Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Title Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication PDF eBook
Author John Melngailis
Publisher
Pages 1122
Release 2000
Genre
ISBN

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Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Title Papers from the 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication PDF eBook
Author John Melngailis
Publisher
Pages 26
Release 2000
Genre Ion beam lithography
ISBN 9781563969690

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Papers from the 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Papers from the 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Title Papers from the 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication PDF eBook
Author Roxann L. Engelstad
Publisher
Pages 24
Release 2004
Genre
ISBN

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Index of Conference Proceedings

Index of Conference Proceedings
Title Index of Conference Proceedings PDF eBook
Author British Library. Document Supply Centre
Publisher
Pages 870
Release 2003
Genre Conference proceedings
ISBN

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Algorithms and Architectures for Parallel Processing

Algorithms and Architectures for Parallel Processing
Title Algorithms and Architectures for Parallel Processing PDF eBook
Author Yang Xiang
Publisher Springer
Pages 581
Release 2012-09-04
Genre Computers
ISBN 3642330789

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The two volume set LNCS 7439 and 7440 comprises the proceedings of the 12th International Conference on Algorithms and Architectures for Parallel Processing, ICA3PP 2012, as well as some workshop papers of the CDCN 2012 workshop which was held in conjunction with this conference. The 40 regular paper and 26 short papers included in these proceedings were carefully reviewed and selected from 156 submissions. The CDCN workshop attracted a total of 19 original submissions, 8 of which are included in part II of these proceedings. The papers cover many dimensions of parallel algorithms and architectures, encompassing fundamental theoretical approaches, practical experimental results, and commercial components and systems.

EUV Lithography

EUV Lithography
Title EUV Lithography PDF eBook
Author Vivek Bakshi
Publisher SPIE Press
Pages 704
Release 2009
Genre Art
ISBN 0819469645

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Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Title Papers from the 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication PDF eBook
Author
Publisher
Pages 477
Release 2006
Genre
ISBN 9780735403819

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