This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.

The objective of this workshop on optical thin films was to generate a list of basic research efforts which should be pursued in thin film processing techniques and thin film diagnostics which would lead to the development of more damage resistant, more predictable and repeatable thin film coatings which would exhibit long life and stable performance. A group of invited papers covering laser damage, surface preparation, film microstructure, deposition techniques and diagnostics were presented. Discussion of the research needs to advance basic understanding and improvement of optical thin films is summarized, and a prioritized research program which has been generated by the Workshop Advisory Committee is given.

As part of the DoD-MURI research program entitled 'Modeling and control of Advanced Chemical Vapor Deposition Processes: the Control of Defects in Mixed III-V Compound Semiconductors' (Grant F49620-95-1-0447), DURIP funding was provided to establish a real-time optical characterization facility to study thin-film growth processes extended to super-atmospheric pressures. The extension of the chemical vapor deposition (CVD) to operating conditions at super-atmospheric pressures mandated validation of: (a) Simulations of surface reaction kinetics; (b) Simulations of homogeneous gas phase reactions coupled to transport in laminar high density vapor flows; and (c) the development of experimental methods for the detection of onset of turbulence, that is, verification of laminar flow under conditions of high pressure OMCVD.

Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.