Investigating the incessant technology growth and the even higher complexity of engineering systems, one of the crucial requirements to confidently steer both scientific and industrial challenges is to identify an appropriate measurement approach. A general process can be considered effective and under control if the following elements are consciously and cyclically managed: numeric target, adequate tools, output analysis, and corrective actions. The role of metrology is to rigorously harmonize this virtuous circle, providing guidance in terms of instruments, standards, and techniques to improve the robustness and the accuracy of the results. This book is designed to offer an interdisciplinary experience into the science of measurement, not only covering high-level measurement strategies but also supplying analytical details and experimental setups.

The goal of acceptable quality, cost, and time is a decisive challenge in every engineering development process. To be familiar with metrology requires choosing the best combination of techniques, standards, and tools to control a project from advanced simulations to final performance measurements and periodic inspections. This book contains a cluster of chapters from international academic authors who provide a meticulous way to discover the impacts of metrology in both theoretical and application fields. The approach is to discuss the key aspects of a selection of untraditional metrological topics, covering the analysis procedures and set of solutions obtained from experimental studies.

Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracy.

In the last few years the automobile design process is required to become more responsible and responsibly related to environmental needs. Basing the automotive design not only on the appearance, the visual appearance of the vehicle needs to be thought together and deeply integrated with the power developed by the engine. The purpose of this book is to try to present the new technologies development scenario, and not to give any indication about the direction that should be given to the research in this complex and multi-disciplinary challenging field.

Optical Metrology is a rapidly expanding field i'n both its scientific foundations and technological developments, being of major concern to measurements, quality control, non-destructive tes ting and in fundamental research. In order to define the state-of-the-art, and to evaluate pre sent accomplishments, whilst giving an appraisal of how each of the particular topics will evolve the Optical Metrology-anAdvancedStudy Institute was organized with a concourse of the world's acknowledged experts. Thus, the Institute provided a forum for tutorial reviews blended with topics of current research in the form of a progressive and comprehensive presentation of recent promising developments, lea ding techniques and instrumentation in incoherent and coherent optics for Metrology, Sensing and Control in Science, Industry and Biomedici ne. Optical Metrology is a very broad field which is highly inter disciplinary in its applications, and in its scientific and technolo gical background. It is related to such diverse disciplines as physi cal and chemical sciences, engineering, electronics, computer scien ces, biological sciences and theoretical sciences, such as statistics. Although there was an emphasis on photomechanics and industri al applications, a marked diversity was reflected in the different background and interests of the participants. The vitality and viabi lity of the discipline was enhanced not only by the encouraging number of young scientists and industrialists participating and authoring, but also by the remarkably promising prospects found in x the practical applications supported by advanced electronic hybridi zation.

This volume is the published Proceedings of selected papers from the IFAC Symposium, Swansea, 11-13 July 1988, where a forum was provided for discussion of the latest advances and techniques in the education of control and instrument engineers. Seven major topics were covered to aid lecturers in understanding, developing and presenting systems engineering - control and measurement - as a subject to undergraduate and postgraduate students. The teaching of real-time computer control as a topic and laboratory experiments for both continuous and discrete systems were discussed, as was process control, with the emphasis on providing the student with engineering experience by using scaled-down equipment which would teach practical skills. Included in the Proceedings are papers on measurement and instrumentation, an area felt to be neglected within academic instruction. The development of software tools for systems design within systems engineering was included, as was the exchange of teaching packages and methods between academics, and the education curriculum of systems engineering within developing countries. These Proceedings will prove to be a useful up-to-date guide and reference source for all lecturers and professors involved in curriculum development and the teaching of control and measurement in systems engineering.