Simulations and experiments have been carried out to investigate advanced time-correlated measurement methods for characterizing and assaying nuclear material for safeguarding the nuclear fuel cycle. These activities are part of a project studying advanced instrumentation techniques in support of the U.S. Department of Energy's Fuel Cycle Research and Development program and its Materials Protection, Accounting, and Control Technologies (MPACT) program. For fiscal year 2011 work focused on examining the practical experimental aspects of using a time-tagged, associated-particle electronic neutron generator for interrogating low-enrichment uranium in combination with steady-state interrogation using a moderated 241Am-Li neutron source. Simulation work for the project involved the use of the MCNP-PoliMi Monte Carlo simulation tool to determine the relative strength and the time-of-flight energy spectra of different sample materials under irradiation. Work also took place to develop a post-processor parser code to extract comparable data from the MCNP5 & 6 codes. Experiments took place using a commercial deuterium-tritium associated-particle electronic neutron generator to irradiate a number of uranium-bearing material samples. Time-correlated measurements of neutron and photon signatures of these measurements were made using five liquid scintillator detectors in a novel array, using high-speed waveform digitizers for data collection. This report summarizes the experiments that took place in FY2011, presents preliminary analyses that have been carried out to date for a subpart of these experiments, and describes future activities planned in this area. The report also describes support Idaho National Laboratory gave to Oak Ridge National Laboratory in 2011 to facilitate 2-dimensional imagery of mixed-oxide fuel pins for safeguards applications as a part of the MPACT program.

Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.