Microwave Plasma Enhanced Chemical Vapor Deposition and Structural Characterization of Diamond Films
Title | Microwave Plasma Enhanced Chemical Vapor Deposition and Structural Characterization of Diamond Films PDF eBook |
Author | Wei Zhu |
Publisher | |
Pages | 530 |
Release | 1990 |
Genre | Diamond thin films |
ISBN |
Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films
Title | Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films PDF eBook |
Author | Kevin John Grannen |
Publisher | |
Pages | |
Release | 1994 |
Genre | |
ISBN |
Synthesis and Characterization of Diamond Thin Films by Microwave Plasma-enhanced Chemical Vapor Deposition (MPECVD)
Title | Synthesis and Characterization of Diamond Thin Films by Microwave Plasma-enhanced Chemical Vapor Deposition (MPECVD) PDF eBook |
Author | Shih-Feng Chou |
Publisher | |
Pages | 174 |
Release | 2005 |
Genre | |
ISBN |
Diamond thin films are deposited on silicon wafers by MPECVD process with the presence of methane, argon, and hydrogen gases. The reaction chamber is designed with an internal microwave reaction cavity and a high-pressure pocket for improving deposition conditions. Scanning electron microscopy reveals tetrahedral and cauliflower-shaped crystals for polycrystalline diamond and nanocrystalline diamond films, respectively. Spectroscopy ellipsometer studies indicate that diamond-like carbon (DLC) films are deposited with a thickness of 700 nm. Fourier transform infrared spectroscopy shows C-H stretching in the range from 2800 cm -1 to 3000 cm -1 . Nanoindentation is performed on DLC films with an average hardness of 10.98 GPa and an average elastic modulus of 90.32 GPa. The effects of chamber pressure, microwave forward power, and gas mixture on the plasma chemistry are discussed. Substrate temperature has a significant influence on film growth rate, and substrate pretreatment can enhance the quality of diamond films.
Characterization of Plasma-Enhanced CVD Processes: Volume 165
Title | Characterization of Plasma-Enhanced CVD Processes: Volume 165 PDF eBook |
Author | Gerald Lucovsky |
Publisher | Mrs Proceedings |
Pages | 280 |
Release | 1990-09-05 |
Genre | Technology & Engineering |
ISBN |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Diamond Films
Title | Diamond Films PDF eBook |
Author | Koji Kobashi |
Publisher | Elsevier |
Pages | 350 |
Release | 2010-07-07 |
Genre | Science |
ISBN | 0080525571 |
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Electrical and Structural Characterization of Diamond Thin Films Grown by Chemical Vapor Deposition
Title | Electrical and Structural Characterization of Diamond Thin Films Grown by Chemical Vapor Deposition PDF eBook |
Author | Ashish Shrotriya |
Publisher | |
Pages | 166 |
Release | 1993 |
Genre | |
ISBN |
Scientific and Technical Aerospace Reports
Title | Scientific and Technical Aerospace Reports PDF eBook |
Author | |
Publisher | |
Pages | 702 |
Release | 1995 |
Genre | Aeronautics |
ISBN |