Significant milestones for quantitative laser-based diagnostics of reacting flows were reached on two separate tasks: (1) the extension of laser-based diagnostics to shorter vacuum ultraviolet (vuv) wavelengths and (2) the development of amplified spontaneous emission (ASE) diagnostics for light atoms. For the first task, phase-matching was applied to produce significant increases in vuv laser intensities, producing over 5 mu J at Lyman alpha (121.6 nm) in a mixture of krypton and argon. Factors affecting the long-term stability of vuv powers were studied. The diagnostic potential of two-photon excited ASE of atomic hydrogen and oxygen was explored in a variety of low-pressure flames. Direct ASE gain measurements gave oxygen concentrations. A model of the ASE signal was developed, and a new understanding of both ASE and laser-induced fluorescence of two-photon excited atoms emerged from this model.

The present volume is essentially a qualitative survey of modern trends in the diagnostics of high-temperature plasmas, with particular orientation toward laboratory plasmas of interest in connection with research in controlled thermonuclear fusion. Among the broad topics considered are probe diagnostics, optical methods (including the use of lasers and holography), microwave diagnostics, and diagnostics with particle beams. Having infor mation on these methods available in compact form and in one place, as is the case in the present volume, should make it pos sible to evaluate different diagnostic approaches to specific prob lems. The volume will be useful as an introduction for advanced students making their first contact with experimental plasma physics and for physicists and engineers who are entering the field and desire a rapid survey of principles and modern trends in the diagnostics of high-temperature plasmas. v Foreword to the American Edition The material in this book is based on lectures given at Mos cow State University. It is intended to acquaint the reader with the basic aspects of plasma diagnostics and contains information re quired for the experimental physicist who wishes to carry out straightforward measurements of laboratory plasmas. It will be evident that in choosing the material we have been guided pri marily by the scientific interests of the author, and the great bulk of the material is based on work carried out in the USSR.

Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.

Updated and expanded from the original Japanese edition, Laser-Aided Diagnostics of Gases and Plasmas takes a unique approach in treating laser-aided diagnostics. The book unifies the subject by joining applications instead of describing each application as a totally separate system. In taking this approach, it highlights the relative strengths of

The two-photon laser induced fluorescence (TALIF) diagnostic has been developed and/or applied to plasma processing systems involving H, 0, and N atoms. Based upon TALIF data, models have been developed for the spatial and temporal variation of the absolute atomic concentrations in H2, 02, and N2 plasmas. The portability of the TALIF diagnostic has been demonstrated. Limitations of the technique due to stimulated emission and fluorescence quenching have been investigated and procedures developed to minimize their effects.

Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.