Ion Implantation Technology - 92
Title | Ion Implantation Technology - 92 PDF eBook |
Author | D.F. Downey |
Publisher | Elsevier |
Pages | 716 |
Release | 2012-12-02 |
Genre | Technology & Engineering |
ISBN | 0444599800 |
Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
Ion Implantation Technology
Title | Ion Implantation Technology PDF eBook |
Author | |
Publisher | |
Pages | 615 |
Release | 1993 |
Genre | Ion implantation |
ISBN |
Ion implantation technology : selected papers of the Ninth International Conference on Ion Implantation Technology (IIT'92) ; Gainesville, FL, USA, September 20 - 24, 1992
Title | Ion implantation technology : selected papers of the Ninth International Conference on Ion Implantation Technology (IIT'92) ; Gainesville, FL, USA, September 20 - 24, 1992 PDF eBook |
Author | Daniel F. Downey |
Publisher | |
Pages | 615 |
Release | 1993 |
Genre | |
ISBN |
Ion Implantation Technology - 94
Title | Ion Implantation Technology - 94 PDF eBook |
Author | S. Coffa |
Publisher | Newnes |
Pages | 1031 |
Release | 1995-05-16 |
Genre | Science |
ISBN | 044459972X |
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Ion Implantation Technology
Title | Ion Implantation Technology PDF eBook |
Author | |
Publisher | |
Pages | 346 |
Release | 1993 |
Genre | |
ISBN |
Handbook of Semiconductor Manufacturing Technology
Title | Handbook of Semiconductor Manufacturing Technology PDF eBook |
Author | Yoshio Nishi |
Publisher | CRC Press |
Pages | 1186 |
Release | 2000-08-09 |
Genre | Technology & Engineering |
ISBN | 9780824787837 |
The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."
Ion Implantation: Basics to Device Fabrication
Title | Ion Implantation: Basics to Device Fabrication PDF eBook |
Author | Emanuele Rimini |
Publisher | Springer Science & Business Media |
Pages | 400 |
Release | 2013-11-27 |
Genre | Technology & Engineering |
ISBN | 1461522595 |
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.