A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

The extensive use of low-energy accelerators in non-nuclear physics has now reached the stage where these activities are recognized as a natural field of investigation. Many other areas in physics and chemistry have undergone similarly spectacular development: beam foil spectroscopy in atomic physics, studies in atomic collisions, materials implantation, defects creation, nuclear microanalysis, and so on. Now, this most recent activity by itself and in its evident connec tion with the others has brought a new impetus to both the funda mental and the applied aspects of materials science. A summer school on "Material Characterization Using Ion Beams" has resulted from these developments and the realization that the use of ion beams is not restricted to accelerators but covers a wide energy range in the developing technology. The idea of the ion beam as a common denominator of many act1v1t1es dealing with surface and near-surface characterization was enthu siastically received by many scientists and a school on this subject received the positive endorsement of NATO. The Advanced Study Institute on Materials Science has assumed for us the status of an "institution" leading to better contact among the many laboratories engaged in this field. The fourth Institute in this series was held in Aleria, Corsica, between August 22 and September 12, 1976.

Author index.

Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.

The nonequilibrium processes associated with ion-solid interactions offer a great potential to synthesize and modify advanced materials. Recent progress in ion beam synthesis and processing has allowed the development of advanced materials with properties designed and tailored specifically for their applications. The design and interpretation of experimental work is supported by modeling and predictive simulations, both from the atomistic and the nonequilibrium thermodynamics viewpoints. This book focuses on those properties of advanced materials that are uniquely suited to modification and improvement by ion beans, eg, electrical, optical, magnetic and structural properties, surface hardness, and nanofabrication. Topics include: fundamentals and defect kinetics; materials with novel electrical, optical and magnetic properties; ion-beam-induced slicing and focused ion beam applications; metastable phases, plastic flow and patterning of surfaces; surface modification (hardness and texture); ion beam synthesis of nanostructures and thin layers; ion-solid interactions for optoelectronics/photonics and microelectronic materials and semiconductor and electronic materials.