The book is geared toward engineers and laser physicists involved in the development of laser-based systems, especially laser systems for directed energy applications. It begins with a review of basic laser properties and moves to definitions and implications of the various standard beam quality metrics such as M2, power in the bucket, brightness, beam parameter product, and Strehl ratio. The practical aspects of beam metrology, which have not been sufficiently addressed in the literature, are amply covered here. For those who are only interested in measuring Gaussian beams from commercial lasers, a reading of Chapter 1, Chapter 2 "What Your Laser Beam Analyzer Manual Didn't Tell You," and the first three sections of Chapter 6 "Cautionary Tales" will be sufficient. For those working in more off-the-map fields such as unique lasers, unstable resonators, multikilowatt lasers, MOPAs, or requirements generation and development, a reading of the entire text is recommended.

In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.

Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

This book contains the proceedings of the 1999 ICFA workshop on the physics of high brightness beams. The workshop took a snapshot in time of a fast moving, interdisciplinary field driven by advanced applications such as high gradient, high energy physics linear colliders, high gain free electron lasers, heavy ion fusion, and transmutation of nuclear materials. While the field of high brightness beam physics has traditionally been divided into disparate electron and heavy ion communities, the workshop brought the two types of researchers together, so that a sharing of insights and methods could be achieved. Thus, this book represents a unifying step in the development of the diverse fascinating discipline of high brightness beam physics, with its challenges rooted in collective, nonlinear particle motion and ultra-high electromagnetic energy density.

This is the third and ?nal volume in a series of Lecture Notes based on the highlysuccessfulEuroSummerSchoolonExoticBeamsthathasbeenrunning yearly since 1993 (apart from 1999) and is planned to continue to do so. It is the aim of the series to provide an introduction to Radioactive Ion Beam (RIB) physics at the level of graduate students and young postdocs starting out in the ?eld. Each volume contains lectures covering a range of topics from nuclear theory to experiment to applications. Our understanding of atomic nuclei has undergone a major re-orientation over the past two decades and seen the emergence of an exciting ?eld of research: the study of ‘exotic’ nuclei. The availability of energetic beams of short-lived nuclei, referred to as ‘radioactive ion beams’ (RIBs), has opened the way to the study of the structure and dynamics of thousands of nuclear species never before observed in the laboratory. This ?eld has now become one of the most important and fast-moving in physics worldwide. And it is fair to say that Europe leads the way with a number of large international projects starting up in the next few years, such as the FAIR facility at GSI in Germany. From a broader perspective, one must also highlight just how widely RIB physics impacts on other areas, from energy and the environment to medicine and materials science.