Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

This book provides a comprehensive introduction to and technical description of a unique patented surface-modification technology: plasma surface metallurgy with double-glow discharge plasma process, known as the Xu-Tec process. As such it promotes further attention and interest in scientific research and engineering development in this area, as well as industrial utilization and product commercialization. The Xu-Tec process has opened up a new material engineering field of “Plasma Surface Metallurgy”. This surface-modification process can transform many low-grade and low-cost industrial engineering materials into “gold” materials with a high value and high grade or special functions. This improved material can be widely used in industrial production to improve the surface performance and quality of mechanical parts and manufacturing products, and to conserve expensive alloying elements for the benefit of all mankind. “This book will be valuable to those in the general area of surface metallurgy. The substantial description of the Xu-Tec process is very important and should assist in expanding the use of this superior technique. The in-depth explanation of glow discharges and their use in general will also serve as a valuable reference in the field.” James E. Thompson, Prof. Fellow of the IEEE Dean of Engineering Emeritus University of Missouri, Columbia, Missouri, USA November, 2016 "A BREAKTHROUGH IN MAKING METAL TOUGHER". ---- SCIENCE & TECHNOLOGY Business Week, July 24, 1989 “NOVEL SURFACE ALLOYING PROCESS” --- THE LEADING EDGE TECHNOLOGY WORDWIDE Materials and Processing Report, Dec. 1987

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

Glow Discharge Optical Emission Spectrometry (GD-OES) is rapidly becoming one of the most important techniques for the direct analysis of solids. This, the first book entirely devoted to the subject, represents the combined contributions of over 30 specialists from around the world. All contributors are active in the field and recognised internationally for their expertise and knowledge in GD-OES. The book begins with an introductory overview of the subjects, deals with the design of the instrument, its operation and analytical methods and describes in detail the complex plasma processes which occur inside the glow discharge source. The second part of the book is more practically orientated, showing the full range of uses for GD-OES from the bulk analysis of virtually any solid material to depth profiling within the first tens of micrometres of a variety of surfaces and coatings. Glow Discharge Optical Emission Spectrometry is intended for a wide audience of scientists, engineers and postgraduate students and will be a valuable and challenging reference work for both experienced users of the technique and newcomers alike.

This multi-author, edited volume includes chapters which deal with both basic and highly complex applications. Glow discharge devices are now being used in very novel ways for the analysis of liquids and gases, including molecular species detection and identification, an area that was beyond the perceived scope of applicability just ten years ago. It is expected that the next decade will see a growth in the interest and application of glow discharge devices far surpassing the expectations of the last century. Responding to the rapid growth in the field Includes both GD-MS and GD-AES In-depth coverage of applications Co-edited by the top names in the field in Europe and US, with high calibre contributions from around the world