Electron energy loss spectroscopy (ELS) is a vast subject with a long and honorable history. The problem of stopping power for high energy particles interested the earliest pioneers of quantum mechanics such as Bohr and Bethe, who laid the theoretical foun dations of the subject. The experimental origins might perhaps be traced to the original Franck-Hertz experiment. The modern field includes topics as diverse as low energy reflection electron energy loss studies of surface vibrational modes, the spectroscopy of gases and the modern theory of plasmon excitation in crystals. For the study of ELS in electron microscopy, several historically distinct areas of physics are relevant, including the theory of the Debye Waller factor for virtual inelastic scattering, the use of complex optical potentials, lattice dynamics for crystalline specimens and the theory of atomic ionisation for isolated atoms. However the field of electron energy loss spectroscopy contains few useful texts which can be recommended for students. With the recent appearance of Raether's and Egerton's hooks (see text for references), we have for the first time both a comprehensive review text-due to Raether-and a lucid introductory text which emphasizes experimental aspects-due to Egerton. Raether's text tends to emphasize the recent work on surface plasmons, while the strength of Egerton's book is its treatment of inner shell excitations for microanalysis, based on the use of atomic wavefunctions for crystal electrons.

This book explains concepts of transmission electron microscopy (TEM) and x-ray diffractometry (XRD) that are important for the characterization of materials. The fourth edition adds important new techniques of TEM such as electron tomography, nanobeam diffraction, and geometric phase analysis. A new chapter on neutron scattering completes the trio of x-ray, electron and neutron diffraction. All chapters were updated and revised for clarity. The book explains the fundamentals of how waves and wavefunctions interact with atoms in solids, and the similarities and differences of using x-rays, electrons, or neutrons for diffraction measurements. Diffraction effects of crystalline order, defects, and disorder in materials are explained in detail. Both practical and theoretical issues are covered. The book can be used in an introductory-level or advanced-level course, since sections are identified by difficulty. Each chapter includes a set of problems to illustrate principles, and the extensive Appendix includes laboratory exercises.

Self-contained and comprehensive, this is the definitive guide to the theory behind X-ray spectroscopy.

A graduate level textbook covering the fundamentals of conventional transmission electron microscopy, first published in 2003.

Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.

A new, comprehensively updated edition of the acclaimed textbook by F.H. Attix (Introduction to Radiological Physics and Radiation Dosimetry) taking into account the substantial developments in dosimetry since its first edition. This monograph covers charged and uncharged particle interactions at a level consistent with the advanced use of the Monte Carlo method in dosimetry; radiation quantities, macroscopic behaviour and the characterization of radiation fields and beams are covered in detail. A number of chapters include addenda presenting derivations and discussions that offer new insight into established dosimetric principles and concepts. The theoretical aspects of dosimetry are given in the comprehensive chapter on cavity theory, followed by the description of primary measurement standards, ionization chambers, chemical dosimeters and solid state detectors. Chapters on applications include reference dosimetry for standard and small fields in radiotherapy, diagnostic radiology and interventional procedures, dosimetry of unsealed and sealed radionuclide sources, and neutron beam dosimetry. The topics are presented in a logical, easy-to-follow sequence and the text is supplemented by numerous illustrative diagrams, tables and appendices. For senior undergraduate- or graduate-level students and professionals.