Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition
Title | Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition PDF eBook |
Author | Jeremy Alfred Theil |
Publisher | |
Pages | 478 |
Release | 1992 |
Genre | |
ISBN |
Plasma Deposition of Amorphous Silicon-Based Materials
Title | Plasma Deposition of Amorphous Silicon-Based Materials PDF eBook |
Author | Pio Capezzuto |
Publisher | Elsevier |
Pages | 339 |
Release | 1995-10-10 |
Genre | Science |
ISBN | 0080539106 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Dissertation Abstracts International
Title | Dissertation Abstracts International PDF eBook |
Author | |
Publisher | |
Pages | 842 |
Release | 2005 |
Genre | Dissertations, Academic |
ISBN |
Plasma Deposition of Amorphous Silicon-based Materials
Title | Plasma Deposition of Amorphous Silicon-based Materials PDF eBook |
Author | Giovanni Bruno |
Publisher | |
Pages | 324 |
Release | 1995 |
Genre | Science |
ISBN | 9780121379407 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Chemical Vapor Deposition
Title | Chemical Vapor Deposition PDF eBook |
Author | Srinivasan Sivaram |
Publisher | |
Pages | 308 |
Release | 2014-01-15 |
Genre | |
ISBN | 9781475747522 |
Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon
Title | Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon PDF eBook |
Author | Krishna Seshan |
Publisher | CRC Press |
Pages | 72 |
Release | 2002-02-01 |
Genre | Science |
ISBN | 1482269686 |
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Characteristics of Silicon Nitride Deposited by VHF (162 MHz)-plasma Enhanced Chemical Vapor Deposition Using a Multi-tile Push–pull Plasma Source
Title | Characteristics of Silicon Nitride Deposited by VHF (162 MHz)-plasma Enhanced Chemical Vapor Deposition Using a Multi-tile Push–pull Plasma Source PDF eBook |
Author | |
Publisher | |
Pages | |
Release | 2016 |
Genre | |
ISBN |
Abstract: To prevent moisture and oxygen permeation into flexible organic electronic devices formed on substrates, the deposition of an inorganic diffusion barrier material such as SiN x is important for thin film encapsulation. In this study, by a very high frequency (162 MHz) plasma-enhanced chemical vapor deposition (VHF-PECVD) using a multi-tile push–pull plasma source, SiN x layers were deposited with a gas mixture of NH3 /SiH4 with/without N2 and the characteristics of the plasma and the deposited SiN x film as the thin film barrier were investigated. Compared to a lower frequency (60 MHz) plasma, the VHF (162 MHz) multi-tile push–pull plasma showed a lower electron temperature, a higher vibrational temperature, and higher N2 dissociation for an N2 plasma. When a SiN x layer was deposited with a mixture of NH3 /SiH4 with N2 at a low temperature of 100 °C, a stoichiometric amorphous Si3 N4 layer with very low Si–H bonding could be deposited. The 300 nm thick SiN x film exhibited a low water vapor transmission rate of 1.18 × 10 −4 g (m 2 · d) −1, in addition to an optical transmittance of higher than 90%.