The interest in diffusion in solids is as old as physical metallurgy or materials science. It stems from application-oriented as well as from scientific reasons. First, a knowledge of diffusion is basic to an understanding of many microstructural changes that occur in solid matter at elevated temperatures. For processes like phase transformations, precipitation or dissolution of a second phase, recrystallization, oxidation, creep, annealing etc., solid state diffusion is fundamental and ubiquitous. The second reason for studying diffusion is to learn more about how atoms move in solid matter. Volume III/26 presents for the first time a comprehensive collection of diffusion data for solid metals and alloys. The critical compilation of data has resulted in tables and series of diagrams which show in 13 chapters data for the following properties: Self- and impurity-diffusion in metallic elements, self-diffusion in homogeneous binary alloys, chemical diffusion in binary and ternary alloys, diffusion in amorphous alloys, diffusion of interstitial foreign atoms like hydrogen, carbon, oxygen and nitrogen in metallic elements, mass and pressure dependence of diffusion, diffusion along dislocations, grain and interphase boundary diffusion, and diffusion on surfaces.

This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.

The energetics and mechanisms of diffusion control the kinetics of such diverse phenomena as the fabrication of semiconductors and superconductors, the tempering of steel, geological metamorphism, the precipitation hardening of nonferrous alloys and corrosion of metals and alloys. This work explains the fundamentals of diffusion in the solid state at a level suitable for upper-level undergraduate and beginning graduate students in materials science, metallurgy, mineralogy, and solid state physics and chemistry. A knowledge of physical chemistry such as is generally provided by a one-year undergraduate course is a prerequisite, though no detailed knowledge of solid state physics or crystallography is required.

Diffusion in Crystalline Solids addresses some of the most active areas of research on diffusion in crystalline solids. Topics covered include measurement of tracer diffusion coefficients in solids, diffusion in silicon and germanium, atom transport in oxides of the fluorite structure, tracer diffusion in concentrated alloys, diffusion in dislocations, grain boundary diffusion mechanisms in metals, and the use of the Monte Carlo Method to simulate diffusion kinetics. This book is made up of eight chapters and begins with an introduction to the measurement of diffusion coefficients with radioisotopes. The following three chapters consider diffusion in materials of substantial technological importance such as silicon and germanium. Atomic transport in oxides of the fluorite structure is described, and diffusion in concentrated alloys, including intermetallic compounds, is analyzed. The next two chapters delve into diffusion along short-circuiting paths, focusing on the effect of diffusion down dislocations on the form of the tracer concentration profile. The book also discusses the mechanisms of diffusion in grain boundaries in metals by invoking considerable work done on grain-boundary structure. The last two chapters are concerned with computer simulation, paying particular attention to machine calculations and the Monte Carlo method. The book concludes by exploring the fundamental atomic migration process and presenting some state-of-the-art calculations for defect energies and the topology of the saddle surface. Students and researchers of material science will find this book extremely useful.

Handbook of Solid State Diffusion, Volume 1: Diffusion Fundamentals and Techniques covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the first of this two-volume set. Volume 1 covers the fundamentals and techniques of solid-state diffusion, beginning with a comprehensive discussion of defects, then different analyzing methods, and finally concluding with an exploration of the different types of modeling techniques. - Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis - Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion - Covers bulk, thin film, and nanomaterials - Introduces the problems and analysis in important materials systems in various applications - Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe

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This work is a classic reference text for metallurgists, material scientists and crystallographers. The first edition was published in 1965. The first part of that edition was revised and re-published in 1975 and again in 1981. The present two-part set represents the eagerly awaited full revision by the author of his seminal work, now published as Parts I and II. Professor Christian was one of the founding fathers of materials science and highly respected worldwide. The new edition of his book deserves a place on the bookshelf of every materials science and engineering department. Suitable thermal and mechanical treatments will produce extensive rearrangements of the atoms in metals and alloys, and corresponding marked variations in physical and chemical properties. This book describes how such changes in the atomic configuration are effected, and discusses the associated kinetic and crystallographic features. It deals with areas such as lattice geometry, point defects, dislocations, stacking faults, grain and interphase boundaries, solid solutions, diffusion, etc. The first part covers the general theory while the second part is concerned with descriptions of specific types of transformations.