Semiconductor industry has primarily been driven by the capability of lithography to pattern smaller and smaller features. However due to increasing mask costs and complexity, and increasing tool costs, the state-of-the-art technology in lithography is accessible only to a select few. Zone-plate array lithography (ZPAL) is a novel method of maskless lithography that aims to alleviate some of these issues while offering a solution that can be extended to the limits of nanolithography. In ZPAL, an array of diffractive lenses is used to form an array of spots on the substrate. Each spot is modulated independently by means of spatial-light modulators. This essentially creates a "parallel laserwriter". In addition, this lithography system can be converted into a parallel-confocal microscope, which enables fast, high-resolution imaging. This thesis addresses the performance of diffractive lenses, particularly high-numerical aperture zone plates for lithography and imaging using a combination of experimental and theoretical studies. A novel proximity-effect correction algorithm that was implemented effectively in a ZPAL system is also described. Variations to another diffractive lens known as the photon sieve are proposed. The first ever lithography results performed using these new elements are presented in this thesis.

Semiconductor lithography is at a crossroads. With mask set costs in excess of one million dollars, long mask turn-around times, and tools that are characterized by their inflexibility and skyrocketing costs, there is a need for a new paradigm in lithography. The work presented in this thesis, Zone-Plate-Array Lithography (ZPAL), bypasses some of the most pressing problems of current lithography equipment by developing a maskless lithography tool that will be scalable, flexible and cost-effective. It is the departure from a century-old tradition of refractive optics, in combination with the use of advanced micromechanics and fast computing, that enables ZPAL to open up a new application space in lithography. This thesis addresses in detail all levels of the ZPAL system, from the micromechanics, to the diffractive optics, to the control system. Special emphasis is placed on the design, fabrication and characterization of high-numerical-aperture diffractive optical elements for lithography and imaging. The results achieved provide conclusive evidence that diffractive optics in general, and zone plates in particular, are capable of state-of-the-art lithography.

Semiconductor lithography is at a crossroads. With mask set costs in excess of $1M, long mask-turn-around times, and tools that are characterized by their inflexibility and skyrocketing costs (in excess of $20M), there is need for a new paradigm in lithography. Zone-Plate-Array Lithography (ZPAL) bypasses some of the most pressing problems of current lithography equipment by offering a maskless lithography tool that is scalable, flexible and low cost. It is the departure from a century-old tradition of refractive optics, in combination with the use of advanced micromechanics and fast computing, that enables ZPAL to open up a new application space in lithography. This report covers in detail all levels of the ZPAL system, from the micromechanics, to the diffractive optics, to the control system. Special emphasis is placed on the design, fabrication and characterization of high-numerical-aperture diffractive-optical elements for lithography and imaging. The results achieved provide conclusive evidence that diffractive optics in general, and zone plates in particular, are capable of state-of-the-art lithography and are extendable to the limits of the lithography process. As a result, ZPAL represents the most promising approach to low cost maskless lithography for the semiconductor industry and other areas of nanoscale science and engineering.

Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics

Proceedings of the 20th Course of the International School of Quantum Electronics held in Erice, Italy, November 14-24, 1996

This book provides the reader with the broad range of materials that were discussed in a series of short courses presented at Georgia Tech on the design, fabrication, and testing of diffractive optical elements (DOEs). Although there are not long derivations or detailed methods for specific engineering calculations, the reader should be familiar and comfortable with basic computational techniques. This text is not a 'cookbook' for producing DOEs, but it should provide readers with sufficient information to assess whether this technology would benefit their work, and to understand the requirements for using the concepts and techniques presented by the authors.