Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is the most versatile of the surface analysis techniques that have been developed during the last 30 years. This is the Second Edition of the first book ToF-SIMS: Surface analysis by Mass Spectrometry to be dedicated to the subject and the treatment is comprehensive

Explores the impact of the latest breakthroughs in cluster SIMS technology Cluster secondary ion mass spectrometry (SIMS) is a high spatial resolution imaging mass spectrometry technique, which can be used to characterize the three-dimensional chemical structure in complex organic and molecular systems. It works by using a cluster ion source to sputter desorb material from a solid sample surface. Prior to the advent of the cluster source, SIMS was severely limited in its ability to characterize soft samples as a result of damage from the atomic source. Molecular samples were essentially destroyed during analysis, limiting the method's sensitivity and precluding compositional depth profiling. The use of new and emerging cluster ion beam technologies has all but eliminated these limitations, enabling researchers to enter into new fields once considered unattainable by the SIMS method. With contributions from leading mass spectrometry researchers around the world, Cluster Secondary Ion Mass Spectrometry: Principles and Applications describes the latest breakthroughs in instrumentation, and addresses best practices in cluster SIMS analysis. It serves as a compendium of knowledge on organic and polymeric surface and in-depth characterization using cluster ion beams. It covers topics ranging from the fundamentals and theory of cluster SIMS, to the important chemistries behind the success of the technique, as well as the wide-ranging applications of the technology. Examples of subjects covered include: Cluster SIMS theory and modeling Cluster ion source types and performance expectations Cluster ion beams for surface analysis experiments Molecular depth profiling and 3-D analysis with cluster ion beams Specialty applications ranging from biological samples analysis to semiconductors/metals analysis Future challenges and prospects for cluster SIMS This book is intended to benefit any scientist, ranging from beginning to advanced in level, with plenty of figures to help better understand complex concepts and processes. In addition, each chapter ends with a detailed reference set to the primary literature, facilitating further research into individual topics where desired. Cluster Secondary Ion Mass Spectrometry: Principles and Applications is a must-have read for any researcher in the surface analysis and/or imaging mass spectrometry fields.

Due to its enormous sensitivity and ease of use, mass spectrometry has grown into the analytical tool of choice in most industries and areas of research. This unique reference provides an extensive library of methods used in mass spectrometry, covering applications of mass spectrometry in fields as diverse as drug discovery, environmental science, forensic science, clinical analysis, polymers, oil composition, doping, cellular research, semiconductor, ceramics, metals and alloys, and homeland security. The book provides the reader with a protocol for the technique described (including sampling methods) and explains why to use a particular method and not others. Essential for MS specialists working in industrial, environmental, and clinical fields.

Cluster ToF-SIMS (time-of-flight secondary ion mass spectrometry) operated in the event-by-event bombardment/detection mode has been applied to: 1) evaluate and screen the manufacturing quality of step-wise prepared micropatterned biointerfaces; 2) quantify the binding density of Au nanoparticles (AuNPs)-antiCD4 conjugates selectively attached on the cell surface; 3) elucidate the biological interaction of proteins and molecules by quantifying the fractional coverage of immobilized biomolecules; 4) enhance the accuracy of secondary ion identification of specific molecules. Briefly, our method consists of recording the secondary ions, SIs, individually emitted from a single projectile impact (C601̕ 2, Au4004). From the set of individual mass data, we select events where a specific SI was detected. The selected records reveal the SIs co-ejected from the nanovolume impacted by an individual cluster projectile from an emission area of 10-20 nm in diameter and an emission depth of 5-10 nm. The approach for quantifying the number of AuNPs or that of specific nanodomains is via the concept of the fractional coverage. The latter is the ratio of the effective number of projectile impacts on a specified sampling area (Ne) to the total number of impacts (N0). The methodology has been validated with the determination of the number of antibody-AuNP conjugates on a cell, i.e. the number of disease related antigens on a cell via their specific binding sites with the AuNP-labeled antibodies. The number of AuNP-antibodies measured, ~42000 per cell, is in good agreement with literature results. The fractional coverage concept was also used to quantify several variants of biointerfaces. An example is the quantification of biotin and avidin immobilization as a function of the composition of silane substrates. The data collected in the event-by-event bombardment/detection mode expands the scope and quality of analytical information. One can identify SIs co-emitted with two specified SIs (double coincidence mass spectrometry) to inspect a specific stratum of a biointerface. A further refinement is the selection of events meeting a double coincidence emission condition. This mode enables the identification of nano-object of a few nm in size, which eliminates (anticoincidence) interferences from substrates.

This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.