Characterization of Organic Thin Films Using Synchrotron X-rays
Title | Characterization of Organic Thin Films Using Synchrotron X-rays PDF eBook |
Author | Amit Malik |
Publisher | |
Pages | |
Release | 1996 |
Genre | |
ISBN |
Characterization of Organic Thin Films
Title | Characterization of Organic Thin Films PDF eBook |
Author | Abraham Ulman |
Publisher | Butterworth-Heinemann |
Pages | 302 |
Release | 1995 |
Genre | Science |
ISBN |
Characterization of Organic Thin Films will help materials scientists, physicists, chemists, and biologists develop a fundamental understanding of structure-properties relationships which in turn makes possible molecular engineering of advanced materials and opens new opportunities in molecular manufacturing.
Advanced Characterization Of Nanostructured Materials: Probing The Structure And Dynamics With Synchrotron X-rays And Neutrons
Title | Advanced Characterization Of Nanostructured Materials: Probing The Structure And Dynamics With Synchrotron X-rays And Neutrons PDF eBook |
Author | Sunil K Sinha |
Publisher | World Scientific |
Pages | 430 |
Release | 2021-03-23 |
Genre | Science |
ISBN | 9811231524 |
Advanced Characterization of Nanostructured Materials — Probing the Structure and Dynamics with Synchrotron X-Rays and Neutrons is a collection of chapters which review the characterization of the structure and internal dynamics of a wide variety of nanostructured materials using various synchrotron X-ray and neutron scattering techniques. It is intended for graduate students and researchers who might be interested in learning about and applying these methods. The authors are well-known practitioners in their fields of research who provide detailed and authoritative accounts of how these techniques have been applied to study systems ranging from thin films and monolayers on solid surfaces and at liquid-air, liquid-liquid and solid-liquid interfaces; nanostructured composite materials; battery materials, and catalytic materials. While there have been a great many books published on nanoscience, there are relatively few that have discussed in one volume detailed synchrotron X-ray and neutron methods for advanced characterization of nanomaterials in thin films, composite materials, catalytic and battery materials and at interfaces. This book should provide an incentive and a reference for researchers in nanomaterials for using these techniques as a powerful way to characterize their samples. It should also help to popularize the use of synchrotron and neutron facilities by the nanoscience community.
Characterization of the Micromechanical Properties of Refractory Thin Films Via Synchrotron X-ray Topography
Title | Characterization of the Micromechanical Properties of Refractory Thin Films Via Synchrotron X-ray Topography PDF eBook |
Author | Waiman Ng |
Publisher | |
Pages | 178 |
Release | 1986 |
Genre | Synchrotron radiation |
ISBN |
Chemical Applications Of Synchrotron Radiation, Part I: Dynamics And Vuv Spectroscopy; Part Ii: X-ray Applications
Title | Chemical Applications Of Synchrotron Radiation, Part I: Dynamics And Vuv Spectroscopy; Part Ii: X-ray Applications PDF eBook |
Author | Tsun-kong Sham |
Publisher | World Scientific |
Pages | 1302 |
Release | 2002-05-30 |
Genre | Science |
ISBN | 9814492027 |
The synchrotron light source is becoming widely available, after its evolution from its infancy in the sixties to the present third generation source with insertion devices. It is timely to examine the impact that synchrotron light has made and will continue to make on chemical research. With this objective in mind, the editor of this invaluable book invited contributions from practitioners who are in the forefront of the research. The book summarizes most of the significant developments in the last decade in chemical and related research using synchrotron light. The utilization of the light as a probe as well as an energy source is emphasized.This book is organized into two parts, in order of increasing photon energy. Part I deals with the applications of low energy photons and covers areas such as gas phase photodissociation reactions and dynamics, soft X-ray fluorescence, IR and photoemission analysis of surfaces, spectroscopy of organic and polymeric materials, catalysts, electronic and magnetic materials, and spectromicroscopy. Part II encompasses applications using soft to hard X-rays, including spectroscopy of surface and thin films, XAFS, diffraction and scattering, and several technological applications, namely the microprobe, photoetching and tribology.
Real Time in Situ Characterization of the Growth of Transition Metal Dichalcogenides Using Synchrotron Radiation
Title | Real Time in Situ Characterization of the Growth of Transition Metal Dichalcogenides Using Synchrotron Radiation PDF eBook |
Author | Hugh Joshua Bullen |
Publisher | |
Pages | 0 |
Release | 2021 |
Genre | |
ISBN |
The isolation of graphene has led to a surge of interest in other 2D materials, primarily layered semiconducting materials that can be utilized in a wide range of applications including but not limited to : optoelectronics, sensing, low-power transistors and flexible electronics. One family of 2D materials that has garnered significant interest is transition metal dichalcogenides. Currently the mechanical exfoliation of these materials is the preferred method for device fabrication. Numerous approaches have been employed to grow crystalline thin films of these materials. Despite the progress that has been made, it is still challenging to achieve growth of defect free, large-area uniform thin films. Before wide-scale application of these materials can be achieved some key issue such as monolayer controllability still need to be further investigated. Here we present our investigation on the thin film growth of 2D transition metal dichalcogenides via metal-organic molecular beam epitaxy (MOMBE), a method not widely used to study the growth of 2D materials, but one that holds promise. This work primarily focuses on the growth of tungsten-based transition metal dichalcogenides and to a lesser extent tungsten-based TMD alloys. We utilize X-ray synchrotron radiation in order to characterize the thin films during growth in situ and in real-time. We also utilize numerous ex situ characterization techniques in this work, such as atomic force microscopy and X-ray photoelectron spectroscopy. We investigate the growth of thin films, specifically the effect of various growth conditions. We consider how the ratio of the incident species affects the growth rate, nucleation and quality of thin films. We also investigated the impact of substrate temperature, the starting substrate and the carrier gas flow rate on the mode of growth, the growth rate, morphology and the composition of the thin films grown by MOMBE. We also employed this approach for the growth of tungsten-based alloys. We find that the carrier gas flow rate and substrate temperature have a significant effect on growth. We also observe that depending on the ratio of incident species, unwanted byproducts may be produced. Finally, using this growth method along with synchrotron characterization techniques, we demonstrate the near layer-by-layer growth of TMD thin films with the expected stoichiometry.
In Situ Real-Time Characterization of Thin Films
Title | In Situ Real-Time Characterization of Thin Films PDF eBook |
Author | Orlando Auciello |
Publisher | John Wiley & Sons |
Pages | 282 |
Release | 2001 |
Genre | Science |
ISBN | 9780471241416 |
An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application